Low pressure arc plasma immersion coating vapor deposition and ion treatment

ABSTRACT

A vacuum coating and plasma treatment system includes a magnetron cathode with a long edge and a short edge. The magnetic pole of the magnetron results in an electromagnetic barrier. At least one remote arc discharge is generated separate from the magnetron cathode and in close proximity to the cathode so that it is confined within a volume adjacent to the magnetron target. The remote arc discharge extends parallel to the long edge of the magnetron target and is defined by the surface of the target on one side and the electromagnetic barrier on all other sides. There is a remote arc discharge cathode hood and anode hood extending over the arc discharge and across the short edge of the magnetron cathode. Outside of the plasma assembly is a magnetic system creating magnetic field lines which extend into and confine the plasma in front of the substrate.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation-in-part of U.S. application Ser. No.13/840,305 filed Mar. 15, 2013, which is a continuation-in-part of U.S.application Ser. No. 13/617,005 filed Sep. 14, 2012, the disclosures ofwhich are incorporated in their entirety by reference herein.

FIELD OF THE INVENTION

The present invention relates to plasma assisted deposition systems andrelated methods.

BACKGROUND OF THE INVENTION

Physical vapor deposition (PVD) and low pressure Chemical vapordeposition (CVD) sources are used for deposition of coatings and surfacetreatment. Conventional metal vapor sources such as electron beamphysical vapor deposition (EBPVD) and magnetron sputtering (MS) metalvapor sources can provide high deposition rates. However, the low energyof the metal vapor atoms and the low ionization rate of these processesresult in coatings with low density, poor adhesion, poor structure andmorphology. It is well established that assistance of the coatingdeposition process with bombardment by energetic particles dramaticallyimproves coatings by densifying the depositing materials, reducing thegrain size and improving coating adhesion. In these processes, thesurface layer is affected by a high rate of bombardment by energeticions which modifies the mobility of depositing metal vapor atoms and, inmany cases, creates metastable structures with unique functionalproperties. Moreover, ion bombardment of the coating surface influencesgas adsorption behavior by increasing the sticking coefficient of gasessuch as nitrogen and changing the nature of adsorption sites from lowerenergy physic-sorption sites to higher energy chemi-sorption sites. Thisapproach is especially productive in the deposition of nanostructuredcomposite coatings with ultra-fine or glass-like amorphous structures.

There are two different approaches to provide ion bombardment assistanceduring PVD or CVD processes. Ion beam assisted deposition (IBAD) is amethod which holds great promise for forming dense ceramic coatings onpolymers and other temperature sensitive materials. The IBAD process istypically carried out under vacuum (˜1×10⁻⁵ Torr) in which a ceramic isthermally evaporated onto a substrate and simultaneously bombarded withenergetic ions. The ion beam causes the deposited atoms to mix with thesubstrate, creating a graded layer, which can improve coating adhesionand reduce film stress. The impinging ions also produce a “shot-peeningeffect” which compacts and densities the layer thereby reducing oreliminating columnar growth.

For example, during the IBAD processing of diamond-like carbon (DLC)films, carbon is evaporated by an electron beam source or sputtered by amagnetron source. Ion bombardment is provided by an independentbroad-aperture ion beam source such as an argon ion beam. Such argon ionbeams do not change the chemistry of the growing films and onlyinfluences its structure, morphology, binding energy and atom-to-atombonding by lattice network modification. Addition of an appropriategaseous precursor to the ion beam results in doping of the growing DLCfilms thereby providing a chemical vapor assistance during the IBADprocess. An example of such silicon doping of DLC films are depositedfrom an Ar+SiH₄ ion beam. Fluoride can be added to the films via an Arand fluorohydrocarbon ion beam, nitrogen can be added by using an Ar andN2 ion beam, and boron can be added by using Ar+BH₄ ion beam. IBAD is aflexible technological process which allows control of coatingproperties in a broadened area by variation of the processingparameters: the ion beam composition, ion energy, ion current and theion-to-atom arrival ratio.

Although the IBAD process works reasonably well, it has limitations dueto its line-in-sight nature which is detrimental to achieving uniformcoating distribution over complex shape components when the conformityof the coating deposition process is important. In addition, the IBADprocess has limited scale up capability. The plasma immersion iondeposition (PIID) process overcomes some of these limitations byproviding a low pressure plasma environment which effectively envelopsthe substrates to be coated within the uniform plasma cloud. Thisresults in a highly uniform rate of ion bombardment over both 3-Dcomplex shape substrates and large loads. The PVD or CVD process is usedto generate vapor species for treatment of the substrate surface. Incontrast to IBAD, the PIID is a non-line-of-sight process capable oftreating complex surfaces without manipulation. PIID utilizes plasmagenerated from a gas discharge that fills in the entire processingchamber thereby allowing complex compositions and architectures to becoated. Examples of plasma immersion ion treatment include ionitriding,carbonitriding, ion implantation and other gaseous ion treatmentprocesses that may be performed by immersing a substrate to be coated ina nitrogen containing plasma under negative bias. In addition, theelectron current extracted from the plasma when substrates arepositively biased can be used for pre-heating and heat treatmentprocesses. Clearly, the non-line-of-sight processing feature presentsnumerous advantages over the line-of-sight processing, particularly forthe efficient processing of a large quantity of 3-D objects. The ionizedgaseous environment used during the PIID processes can be generated byapplying different types of plasma discharges, such as glow discharge,RF discharge, micro-wave (MW) discharge and low pressure arc discharge.Low pressure arc discharge is particularly advantageous in that itprovides a dense, uniform highly ionized plasma over large processingvolumes at low cost. In the arc discharge plasma assisted coatingdeposition or ion treatment processes, substrates are positioned betweenthe arc cathode and the remote arc anode within the arc discharge plasmaarea. Thermionic filament cathodes, hollow cathodes, vacuum arcevaporating cold cathodes, and combinations thereof can be used aselectron emitters for generating a gaseous low pressure arc plasmadischarge environment. Alternatively, the conductive evaporativematerial itself can be used as a cathode or an anode of an ionizing arcdischarge. This latter feature is provided in the vacuum cathodic arcdeposition processes or in various arc plasma enhanced electron beam andthermal evaporation processes.

Deposition of a reacted coating like CrN may be accomplished by variousphysical vapor deposition techniques such as cathodic arc deposition,filtered arc deposition, electron beam evaporation and sputterdeposition techniques. Electron beam physical vapor deposition (EBPVD)technology, both conventional and ionized, has been used in manyapplications, but is generally not considered a viable manufacturingtechnology in many fields because of batch-processing issues,difficulties of scaling up to achieve uniform coating distributionacross large substrates and because of the difficulty of multi-elementalcoating composition control due to thermodynamically driven distillationof the elements with different vapor pressures. In contrast, magnetronsputtering (MS) based PVD is used for a wide variety of applications dueto the high uniformity of magnetron coatings at acceptable depositionrates, precise control of multi-elemental coating composition and theability of the MS process to be easily integrated in fully automatedindustrial batch coating systems. Cathodic and anodic arc enhancedelectron beam physical vapor deposition (EBPVD) processes dubbed hotevaporated cathode (HEC) and hot evaporated anode (HEA) respectivelyhave demonstrated increased ionization rate, but suffer from arc spotsinstabilities and non-uniform distribution of the ionization rate acrossthe EBPVD metal vapor flow. In these processes, the arc discharge iscoupled with evaporation process making it difficult to provideindependent control of ionization and evaporation rates in HEA and HECprocesses. Therefore, it is extremely difficult to integrate PA-EBPVDprocesses in fully automated industrial batch coating systems.

Sputter techniques are well known in the art as being capable of costeffectively depositing thick reacted coatings although films beyondabout one micron tend to develop haziness due to crystallization. Thecrystallization phenomenon or columnar film growth is associated withthe inherent low energy of depositing atoms in sputter depositiontechniques thereby creating an opportunity for energetically favoredcrystal structures. These crystal structures may have undesiredanisotropic properties specific for wear and cosmetic applications.Various approaches have been developed over the last decade to enhancethe ionization rate in a magnetron sputtering process. The main goal ofthese approaches is to increase the electron density along the pass ofthe magnetron sputtering atoms flow thereby increasing ionization ofmetal atoms by increasing the frequency of electron-atom collisions. Thehigh power impulse magnetron sputtering (HIPIMS) process uses high powerpulses applied to the magnetron target concurrently with DC power toincrease electron emission and consequently increase the ionization rateof metal sputtering flow. This process demonstrates improved coatingproperties in the deposition of nitride wear resistant coatings forcutting tools. In the HIPIMS process, improved ionization is achievedonly during short pulse times, while during pauses, the ionization rateis low as in conventional DC-MS processes. Since the pulse parametersare coupled with magnetron sputtering process parameters in the HIPIMSprocess, the sputtering rate, which is found to be almost three timeslower than that of the conventional DC-MS process, can be adverselyaffected. Moreover, the high voltage pulses in the HIPIMS process mayinduce arcing on magnetron targets resulting in contamination of thegrowing films.

In order to generate a highly ionized discharge in a vicinity ofmagnetron targets, an inductively coupled plasma (ICP) source can beadded in the region between the cathode and the substrate. Anon-resonant induction coil is then placed parallel to the cathode inessentially a conventional DC-MS apparatus, immersed or adjacent to theplasma. The inductive coil is generally driven at 13.56 MHz using a 50ΩRF power supply through a capacitive matching network. The RF power isoften coupled to the plasma across a dielectric window or wall.Inductively coupled discharges are commonly operated in the pressurerange of 1-50 mTorr and applied power 200-1000 W resulting in anelectron density in the range of 10¹⁶-10¹⁸ m⁻³ which is generally foundto increase linearly with increasing applied power. In a magnetronsputtering discharge, metal atoms are sputtered from the cathode targetusing dc or RF power. The metal atoms transit the dense plasma, createdby the RF coil, where they are ionized. A water cooled inductive coilplaced between the magnetron target and substrates to be coatedadversely affects the metal sputtering flow. The MS setup is thereforemuch more complicated, expensive, and difficult to integrate intoexisting batch coating and in-line coating system. These disadvantagesare also true for the microwave assisted magnetron sputtering (MW-MS)process. In the MW-MS process, the vacuum processing chamber layout mustbe re-designed to allow the metal sputtering flow crossing an ionizationzone. However, the RF, MW and ICP approaches to ionizing the PVD processexperience difficulties with plasma distribution uniformity over a largeprocessing area, which is an obstacle for integration into large areacoating deposition systems.

Another prior art technique for producing energetic ions is plasmaenhanced magnetron sputtering (PEMS) which has a thermionic hot filamentcathode (HF-MS) or hollow cathode (HC-MS) as a source of ionizedelectrons to increase the ionization rate in the DC-MS process. In theHF-MS process, a distant thermionic filament cathode is used as a sourceof ionizing electrons making this process similar to the HC-MS process.However, this process typically exhibits plasma non-uniformity and isdifficult to integrate in industrial large area coating systems.Moreover, both hot filaments and hollow arc cathodes are sensitive anddegrade quickly in the reactive plasma atmosphere. The disadvantages ofthese plasma generating processes are overcome by utilizing a coldevaporative vacuum arc cathode as a source of electrons for ionizationand activation of a vapor deposition processing environment.

The cosmetic appearance of the conventional cathodic arc deposited filmsincludes particulates of un-reacted target material called macros thatrenders the deposited film with defects undesired in applicationsrequiring specific wear, corrosion and cosmetic properties. However, arcdeposited films do not have a crystalline character unlike sputteredfilms because the arc evaporation process produces highly ionized plasmawith a high energy of depositing atoms believed to effectively randomizecrystal structures in the developing film.

Accordingly, there is a need for additional techniques of producingenergetic particles in coating processes to produce improved filmproperties.

SUMMARY OF THE INVENTION

The present invention solves one or more problems of the prior art byproviding in at least one embodiment a system for vacuum coating andplasma treatment. A vacuum coating and plasma treatment system includesa plasma assembly facing a substrate having a magnetron cathode with along edge, a short edge and a magnetic pole. The magnetic pole resultsin a sputtering racetrack in a target surface and an electromagneticbarrier. An anode is electrically connected to the magnetron cathode. Atleast one remote arc discharge is generated separate from the magnetroncathode and in close proximity to the cathode so that it is confinedwithin a volume adjacent to the magnetron target. The remote arcdischarge extends parallel to the long edge of the magnetron target andis defined by the surface of the target on one side and theelectromagnetic barrier on all other sides. There is a remote arcdischarge cathode hood and anode hood extending over the arc dischargeand across the short edge of the magnetron cathode. Outside of theplasma assembly is a magnetic system creating magnetic field lines whichextend into and confine the plasma in front of the plasma assembly andthe substrate. A magnetron cathode power supply is connected to themagnetron cathode and to the anode, and a remote arc discharge powersupply is connected between at least two remote arc dischargeelectrodes.

In another embodiment, a vacuum coating and plasma treatment systemincludes a plasma assembly facing a substrate having a magnetron cathodewith a long edge, a short edge and a magnetic pole. The magnetic poleresults in a sputtering racetrack in a target surface and anelectromagnetic barrier. An anode is electrically connected to themagnetron cathode. At least one remote arc discharge is generatedseparate from the magnetron cathode and in close proximity to thecathode so that it is confined within a volume adjacent to the magnetrontarget. The remote arc discharge extends parallel to the long edge ofthe magnetron target and is defined by the surface of the target on oneside and the electromagnetic barrier on all other sides. There is aremote arc discharge cathode hood and anode hood extending over the arcdischarge and across the short edge of the magnetron cathode. A wireelectrode is shaped in a convex direction toward the substrate. Outsideof the plasma assembly is a magnetic system creating magnetic fieldlines which extend into and confine the plasma in front of the plasmaassembly and the substrate. A magnetron cathode power supply isconnected to the magnetron cathode and to the anode, and a remote arcdischarge power supply is connected between at least two remote arcdischarge electrodes.

In still another embodiment, a method of coating a substrate in thecoating system set forth above is provided. The method includes a stepof powering a cathode and powering an arc discharge. A magnetic coil ispowered and gas is flowing in a vacuum chamber. The gas is pumped fromthe vacuum chamber while a coating is deposited onto a substrate.

BRIEF DESCRIPTION OF THE DRAWINGS

Exemplary embodiments of the present invention will become more fullyunderstood from the detailed description and the accompanying drawings,wherein:

FIG. 1A is an idealized side view of a coating system using a remote arcdischarge plasma;

FIG. 1B is a front view of the coating system perpendicular to the viewof FIG. 1A;

FIG. 1C is a schematic of the coating system of FIG. 1A;

FIG. 1D is a schematic illustration showing confinement of the plasmajet streaming between the cathode and remote anode;

FIG. 1E is a schematic of a multi-element cathode used to raster aplasma jet;

FIG. 2 provides a typical distribution of the plasma potential betweenthe screen and the remote anode obtained by finite element modeling;

FIG. 3 provides the intensity of the radiation emitted by excited argonatoms (spectral line ArI 739.79 nm) from the remote arc discharge plasmaversus the discharge current;

FIG. 4A provides a schematic of a coating system having additionalremote anodes positioned between the magnetron sputtering source withadditional shielded cathode chamber assemblies added to secure theuniformity and high ionization of a gaseous plasma environment;

FIG. 4B provides a schematic illustration of a coating system whichincludes variable resistors installed between a master anode and each ofa plurality of slave anodes;

FIG. 4C provides a refinement in which a resistor in parallel with acapacitor is used to set the voltage potentials of the intermediateanode;

FIG. 5 provides a schematic illustration of an inline modularconfiguration of a remote arc assisted magnetron sputtering (RAAMS)system;

FIG. 6 provides a diagram of potential distribution in RAD plasmaprocessing;

FIGS. 7A and 7B provide a schematic illustration of a batch coatingsystem with a centrally located shielded cathode chamber;

FIG. 8A is a schematic illustration of a variation of the system ofFIGS. 7A and 7B;

FIG. 8B is a schematic illustration of a variation of the system ofFIGS. 7A and 7B;

FIG. 8C is a schematic illustration of a variation of the system ofFIGS. 7A and 7B;

FIG. 8D is a schematic illustration of a variation of the system ofFIGS. 7A and 7B;

FIG. 8E is a schematic illustration of a variation of the system ofFIGS. 7A and 7B;

FIG. 8F is a schematic illustration of a variation of the system ofFIGS. 7A and 7B;

FIG. 8G is a schematic illustration providing magnetic contours for thesystems of FIGS. 8A-8C;

FIG. 8H is a schematic illustration providing magnetic contours for thesystems of FIGS. 8A-8C;

FIG. 9A is a schematic illustration of a coating system havingadditional magnetrons;

FIG. 9B is a schematic illustration of a coating system havingadditional magnetrons;

FIG. 9C is a schematic illustration of a coating system havingadditional magnetrons;

FIG. 9D is a schematic illustration of a coating system havingadditional magnetrons;

FIG. 9E is a schematic illustration of a coating system havingadditional magnetrons;

FIG. 10 provides a schematic description of the physical processes whichare involved in the bi-directional remote arc discharge;

FIG. 11 provides a schematic of a batch coating system with aperipherally located shielded cathode chamber assembly;

FIG. 12 is a schematic illustration of a further variation having ashielded cathodic arc electron emission source located in the center ofthe coating chamber;

FIG. 13 provides a schematic illustrations of a system incorporating anelectron emitting vacuum arc cold cathode source are provided;

FIG. 14A provides a schematic illustration of a variation of a coatingsystem incorporating a macroparticle filter;

FIG. 14B provides a schematic illustration of a variation of a coatingsystem incorporating a macroparticle filter;

FIG. 14C provides a schematic illustration of a variation of a coatingsystem incorporating a macroparticle filter;

FIG. 15A is a schematic side view of the RAAMS system;

FIG. 15B is a schematic side view perpendicular to the view of FIG. 15A;

FIG. 16 is a schematic illustration of a variation of FIGS. 15A and 15Bwith a cathode in one of the compartments of the cathode chamber andwith two cathodic arc spots;

FIG. 17 is a schematic illustration of an alternative configuration ofthe remote plasma system utilizing a coaxial batch coating chamberlayout with planar magnetron sources;

FIG. 18A provides a schematic illustration of a refinement with separateprimary cathode chambers for each magnetron sputtering source;

FIG. 18B provides a schematic illustration of a refinement with separateprimary cathode chambers for each magnetron sputtering source;

FIG. 19A provides a schematic illustration of an advanced variation ofthe systems of FIG. 14-18;

FIG. 19B provides a schematic illustration of a variation of the systemof FIG. 19A;

FIG. 19C provides a schematic illustration of a variation of the systemof FIG. 19A;

FIG. 19D provides a perspective view of the RAAMS module with anelectrode grid;

FIG. 19E provides a schematic of a system of another remote anodecoating system;

FIG. 19F is a transversal cross-section of the system shown in FIG. 19E;

FIG. 20 provides a schematic illustration of a variation in which theelectron emission cathodic arc source with a non-consumable cathode

FIG. 21A provides a schematic in which a substrate holder is positionedbetween an anode and a magnetron sputtering source;

FIG. 21B provides a schematic in which a wire anode is positionedbetween a substrate holder and a magnetron sputtering source;

FIG. 22A is a transversal cross-section of the system shown withmagnetic coils for confinement;

FIG. 22B is a transversal cross-section of the system shown withmagnetic coils for confinement and with a magnetron cathode facinganother magnetron cathode where each polarity mirrors the other cathodepolarity;

FIG. 22C is a transversal cross-section of the system shown withmagnetic coils for confinement and with a magnetron cathode facinganother magnetron cathode where each polarity is the opposite of theother cathode polarity;

FIG. 22D is a cross-section side view of the system shown in FIG. 22Awith a DC power supply for the cathode;

FIG. 22E is a transversal cross-section showing a wire anode positionedalong the magnetic field lines emanating from the coil;

FIG. 22F is a cross-section side view of the system shown in FIG. 22Awith a RF power supply for the cathode;

FIG. 22G is a cross-section side view of the system shown in FIG. 22Awith a DC pulse power supply for the cathode;

FIG. 23 is a prospective view of the magnetic mirror confinement coilsand the remote arc plasma adjacent the target and cathode;

FIG. 24A is a transversal cross-section showing multiple coatingassemblies facing coating assemblies with the substrate in between;

FIG. 24B is a transversal cross-section of multiple coating assembliesfacing coating assemblies with the substrate in between and includingthe wire anode of FIG. 22;

FIG. 24C shows modeled magnetic field lines where the polarity of themagnetic field is mirrored at the opposite side of an inline system.

FIG. 24D shows modeled magnetic field lines where the polarity of themagnetic field is mirrored at the opposite side of an inline system andthe magnetic coil current is higher than in FIG. 24C.

FIG. 24E shows modeled magnetic field lines where the polarity of themagnetic field is mirrored at the opposite side of an inline system andno magnetic coil current.

FIG. 25A is a longitudinal cross-section view showing two remote arc jetdischarges.

FIG. 25B is a longitudinal cross-section showing a variation where thecathode hood penetrates the short portion of the magnetron cathode;

FIG. 25C is a transversal cross-section showing the confinement of theremote plasma jets within the magnetron discharge;

FIG. 25D is a transversal cross-section showing the confinement of theremote plasma jets within the magnetron discharge generated fromelectromagnetic coils;

FIG. 25E is a transversal cross-section showing the confinement of theremote plasma jets within the magnetron discharge generated fromelectromagnetic coils oriented away from the back side of the target;

FIG. 25F is a prospective view of the coating assembly utilizing fourelectromagnetic coils to create four racetracks on one target;

FIG. 25G is a transversal cross-section showing the confinement of theremote plasma jets within the magnetron discharge generated byelectromagnetic coils;

FIG. 25H is a cross-section side view showing the primary arc electrodepositioned in the magnetron discharge generated by a yoke-shapedpermanent magnet;

FIG. 25I is a cross-section side view showing the primary arc electrodepositioned in the magnetron discharge generated by a yoke-shapedpermanent magnet and a thin, movable sheet of sputtered target;

FIG. 25J is a cross-section showing the sputtering target in the form ofa disk with parallel remote arc discharges;

FIG. 25K is a longitudinal cross-section showing a variation where thecathode hood penetrates the short portion of the magnetron cathode withan electromagnetic coil surrounding the cathode;

FIG. 25L is a schematic of an inline configuration of the RAAMS withelectromagnetic enhancement;

FIG. 25M is a schematic view of a refinement of the electromagneticallyenhanced RAAMS inline chamber with rotary magnetrons;

FIG. 26A is a longitudinal cross-section showing the primary arcelectrodes positioned in the magnetron discharge;

FIG. 26B is a cross-section side view showing the primary arc electrodepositioned in the magnetron discharge;

FIG. 26C is a prospective view of the coating assembly with the primaryrod cathode and primary rod anode positioned in the short portion of themagnetron discharge;

FIG. 26D is a prospective view of the coating assembly with the rodelectrodes positioned in the short portion of the magnetron discharge;

FIG. 26E is a prospective view where the primary arc discharge isgenerated by an arcjet thruster positioned adjacent the short portion ofthe magnetron racetrack.

FIG. 26F is a prospective view of the cathode assembly with rodelectrodes on opposite ends of the short portion of the magnetrondischarge and a pulsed DC power supply for the rod electrodes;

FIG. 26G is a prospective view of the cathode assembly with rodelectrodes on opposite ends of the short portion of the magnetrondischarge and an RF power supply for the rod electrodes;

FIG. 27A is a plot of the intensity of the Cr spectra in the plasmaversus the arc discharge current, with and without opposing coatingassemblies of FIGS. 22B and 22C and without current in the confiningcoils;

FIG. 27B is a plot of the intensity of excited Ar and nitrogen atoms ina Ar/N2 gas mixture versus arc discharge current;

FIG. 28A is a schematic illustration of a plasma monitor used for themeasurement of the chrome intensity of FIG. 27.

FIG. 28B is a plot of the intensity of the Cr spectra in the plasmaversus the remote anode current, with and without opposing coatingassemblies of FIGS. 22B and 22C and without current in the confiningcoils;

FIG. 29A is a schematic of a substrate with a coating made by a remotearc discharge plasma assisted process; and

FIG. 29B is a schematic of a substrate with a multilayer coating made bya remote arc discharge plasma assisted process.

DETAILED DESCRIPTION

Reference will now be made in detail to presently preferredcompositions, embodiments and methods of the present invention, whichconstitute the best modes of practicing the invention presently known tothe inventors. The Figures are not necessarily to scale. However, it isto be understood that the disclosed embodiments are merely exemplary ofthe invention that may be embodied in various and alternative forms.Therefore, specific details disclosed herein are not to be interpretedas limiting, but merely as a representative basis for any aspect of theinvention and/or as a representative basis for teaching one skilled inthe art to variously employ the present invention.

Except in the examples, or where otherwise expressly indicated, allnumerical quantities in this description indicating amounts of materialor conditions of reaction and/or use are to be understood as modified bythe word “about” in describing the broadest scope of the invention.Practice within the numerical limits stated is generally preferred.Also, unless expressly stated to the contrary: percent, “parts of,” andratio values are by weight; the description of a group or class ofmaterials as suitable or preferred for a given purpose in connectionwith the invention implies that mixtures of any two or more of themembers of the group or class are equally suitable or preferred;description of constituents in chemical terms refers to the constituentsat the time of addition to any combination specified in the description,and does not necessarily preclude chemical interactions among theconstituents of a mixture once mixed; the first definition of an acronymor other abbreviation applies to all subsequent uses herein of the sameabbreviation and applies mutatis mutandis to normal grammaticalvariations of the initially defined abbreviation; and, unless expresslystated to the contrary, measurement of a property is determined by thesame technique as previously or later referenced for the same property.

It is also to be understood that this invention is not limited to thespecific embodiments and methods described below, as specific componentsand/or conditions may, of course, vary. Furthermore, the terminologyused herein is used only for the purpose of describing particularembodiments of the present invention and is not intended to be limitingin any way.

It must also be noted that, as used in the specification and theappended claims, the singular form “a,” “an,” and “the” comprise pluralreferents unless the context clearly indicates otherwise. For example,reference to a component in the singular is intended to comprise aplurality of components.

Throughout this application, where publications are referenced, thedisclosures of these publications in their entireties are herebyincorporated by reference into this application to more fully describethe state of the art to which this invention pertains.

With reference to FIGS. 1A, 1B, 1C and 1D, a coating system that uses aremote arc discharge plasma is provided. FIG. 1A is an idealized sideview of the coating system. FIG. 1B is a front view perpendicular to theview of FIG. 1A. FIG. 1C is a schematic of the coating system includingelectrical wiring. The system of this embodiment is particularly usefulfor arc plasma enhancement of large area magnetron sputtering coatingdeposition processes. Coating system 10 includes vacuum chamber 12 witha coating assembly positioned therein. The coating assembly includesvapor source 16, cathode chamber assembly 18 positioned in vacuumchamber 12, and substrate holder 20 to hold substrates 22 to be coated.FIGS. 1A and 1B depict a variation in which vapor source 16 is amagnetron sputtering source so that the coating process of system 10 isa remote arc assisted magnetron sputtering (RAAMS) process. Suchmagnetron sputtering sources include a target Ts, a power supply Ps, andan anode As. It should be appreciated that other types of vapor sourcesmay be utilized for vapor source 16. Examples of such vapor sourcesinclude, but are not limited to, thermal evaporators, electron beamevaporators, cathodic arc evaporators, and the like. Substrates 22 arepositioned in front of the vapor source 16 during coating and move alongdirection d1 during deposition of the coating. In a refinement,substrates may be continuously introduced from a load-lock chamber atthe right of vacuum chamber 12 and received by an output chamber at theleft of vacuum chamber 12 in FIG. 1A. Cathode chamber assembly 18includes a cathode enclosure 24 with openings 26 defined therein,electron emitting cathode 28, an optional separate primary anode 34 andshield 36. Shield 36 isolates electron emitting cathode 28 from vacuumchamber 12. In a refinement, optional separate anode 34, cathodeenclosure 24, shield 36, or a ground connection operate as the primarycathode-coupled anode.

Cathode chamber assembly 18 operates as an electron emitting cathodesource in the context of the present embodiment. In a refinement, aprimary arc is generated in the electron emitting cathode source betweencathode 28 and the primary anode. The cathode enclosure 24 can serveboth as an independent primary anode connected to the positive pole ofthe primary arc power supply 48 and as a grounded anode, when it isconnected to the ground 34. Shield 36 defines openings 38 fortransmitting electron emission current 40 from cathode 28 into vacuumchamber 12. The shield can be floating or it can be connected to thepositive pole of either primary arc power supply 48 or an additionalpower supply (not shown). In another refinement, cathode 28 is acathodic arc cathode and the grounded primary anode 34 is a cathodic arcanode. Any number of different cathodes may be used for electronemitting cathode 28. Examples of such cathodes include, but are notlimited to, cold vacuum arc cathodes, hollow cathodes, thermionicfilament cathodes, and the like, and combinations thereof. Typically,the cathode target is made of metal having a gettering capabilityincluding titanium and zirconium alloys. In a refinement, the shield ofthe cathode chamber is water cooled and negatively biased in relation tothe cathode target wherein the bias potential of the shield ranges from−50 volts to −1000 volts. In still another refinement, cathode chamberassembly 18 includes a cathode array having a plurality of cathodetargets installed therein with the height of cathode target array beingsubstantially the same height of the remote anode and the height of adeposition area. Separation from the top of the cathode chamber assemblyor vapor source 16 to substrates 22 (i.e., top of the substrates) issuch that the plasma streaming from cathode 28 to remote anode 44 isconfined. Typically, separation distance from the shield 36 of thecathode chamber assembly or from the evaporation surface of the vaporsource 16 or from the remote anode 44 to substrates 22 is from about 2inches to about 20 inches, which result in a formation of a narrowcorridor for confinement of the remote arc plasma between the cathode 28in a cathode chamber 18 and the remote anode 44. When the width of thiscorridor is less than 2 inches it creates high impedance in plasmaleading to plasma instabilities and eventually extinguishing of theremote arc discharge. When the width of this corridor is greater than 20inches the plasma density in the remote arc discharge is not increasingenough to ionize the metal sputtering flow. In a particularly usefulrefinement, a large area cathode target having a shape of plate or baris installed in the cathode chamber assembly 18. Typically, such a largearea cathode target has a height that is substantially equal to theheight of the anode and the height of a deposition area. In arefinement, the cathode target can be made of the metal having agettering capability such as for example titanium alloy or zirconiumalloy. In this case the shielded cathode electron emitting source canalso serve as a vacuum gettering pump which can improve pumpingefficiency of the coating system. To further improve the getteringpumping efficiency the shield 36 facing the evaporating surface of thecathode target 28 in the cathode chamber 18 can be water cooled andoptionally connected to high voltage bias power supply. When the watercooled shield 36 is biased to high negative potential ranging from −50Vto −1000V in relation to the cathode target 28, it will be subjected tointense ion bombardment by metal ions generating by the cathodic arcevaporating process. Condensation of metal vapor under conditions ofintense ion bombardment is favorable for pumping noble gases such as He,Ar, Ne, Xe, Kr as well as hydrogen.

System 10 also includes remote anode 44 electrically coupled to cathode28, primary power supply 48 connected between cathode 28 and the primarycathode-coupled anode. Remote anode 44 is positioned in vacuum chamber12 such that vapor source 16 is positioned between cathode chamberassembly 18 and the remote anode. In a refinement, a plurality of vaporsources is positioned between cathode chamber assembly 18 and remoteanode 44 as set forth below in more detail. System 10 also includessecondary power supply 52 which electrically couples cathode 28 toremote anode 44. Low pass filter 54 is also depicted in FIG. 1A whichincludes resistor R and capacitor C. Typically, vapor source 16 ispositioned between cathode chamber assembly 18 and remote anode 44.System 10 further includes pumping system 56 for maintaining a reducedpressure and gas system 58 for introducing one or more gases (e.g.,argon, nitrogen, helium, etc.) into deposition chamber 12. In arefinement, secondary power supply 52, which powers the distant arcdischarge in coating chamber 12 is installed between cathode chamberassembly 18 and remote anode 44 and provides at least 20% higher opencircuit voltage than primary power supply 48.

Still referring to FIGS. 1A, 1B, 1C, and 1D, a primary arc is initiatedby arc igniter 60 in a cathode chamber 24 isolated from the dischargechamber by shield 36 with openings 38 for transmission of the electroncurrent 40. Typically, the plasma potential near the screen is low,close to the plasma potential in cathode chamber assembly 18, while inthe remote arc discharge plasma, the electric potential is high, closeto the electrical potential of remote anode 44. FIG. 2 provides atypical distribution of the plasma potential between the screen and theremote anode obtained by finite element modeling. Surprisingly, thepresent coating system is found to produce a confined plasma arc thatstreams from cathode chamber assembly 18 to remote anode 44. FIG. 1Dprovides a schematic illustration showing the movement of the plasmadensity between remote anode 44 and cathode 28. A confined plasmastreams (i.e., a plasma jet) between the remote anode and the cathodethrough the coating region. The ends of the confined plasma move alongdirection d4 as set forth in FIG. 1D. An arc spot 66 forms on cathode 28along with erosion zone 68. The plasma field 62 at remote anode 44 andthe plasma field 64 at cathode 28 are confined dimensionally in a spacefrom about 1 to 5 inches along direction d4. In one refinement, magneticfields are used to accomplish the rastering movement along d4. Inanother refinement, this rastering movement is accomplished bymechanically moving cathode 28 along direction d4. In still otherrefinements, an emission filament bombarding cathode with electrons ismoved along d₄. In still other refinements as shown in FIG. 1E, thecathode includes a plurality of cathode elements 28 ¹⁻⁶ which aresequentially activated in order to form a plasma jet moving along d4.The confinement of the plasma arc results in a high density and hotplasma jet connecting cathodic arc spots at the primary cathode with anassociated area at the remote anode running through a relatively narrowcorridor created between the chamber walls (with primary cathodes,anodes and magnetrons attached) and substrate holder. This results in ahigh current density in the moving plasma jet connecting the cathode andremote anode. In a refinement, the current density in RAAMS plasmawithin this narrow corridor is from 0.1 mA/cm² up to 100 A/cm².Typically, the electron density n_(e) in the background remote arcplasma ranges from about n_(e)˜10⁸ cm⁻³ to about n_(e)˜10¹⁰ cm⁻³ whilewithin the confined arc plasma jet area the electron density ranges fromabout n_(e)˜10¹⁰ cm⁻³ to about n_(e)˜10¹³ cm⁻³. The confinement creatingthe plasma jet is a result of the physical dimensional relations betweenthe components as set forth below as well as the application of magneticfields. In particular, the discharge operates at very high plasmapotential which corresponds to a high energy of ion bombardment (i.e.,the ion bombardment energy is the difference between the plasmapotential (vs. ground) and the substrate bias potential (vs. ground)).Even at floating and grounded substrates, ions with 50-70 eV areobtained because the plasma potential is above 50 V. In a refinement,the plasma potential is from 5V to 500V.

With reference to FIGS. 1A and 1B, an aspect of the relative sizing ofvarious components of coating system 10 is provided. Remote anode 44 hasa linear remote anode dimension Da. Vapor source 16 has a linear vaporsource dimension D_(v). Cathode target Ts has a linear cathode targetdimension D_(c). Substrate holder 20 has a linear holder dimensionD_(h). In a refinement, the linear remote anode dimension D_(a), thelinear vapor source dimension D_(v), the linear cathode target dimensionD_(c). and the linear holder dimension D_(h) are parallel to each other.In another refinement, the linear remote anode dimension D_(a) isgreater than or equal to the linear vapor source dimension D_(v) whichis greater than or equal to the linear cathode target dimension D_(c)which is greater than or equal to the linear holder dimension D_(h).

In a variation of the present embodiment, several remote anodes areassociated with (i.e., electrically coupled to) at least one arc cathodepositioned in the shielded cathodic chamber assembly 18. The remoteanodes are positioned at strategic positions within the coating chamber.

In another variation, the perpendicular distances between each of thevapor sources (e.g., vapor source 16) and substrates 22 to be coated issubstantially equal. Moreover, in a further refinement, the distancebetween cathode 28 and remote anode 44 is less than the distance atwhich breakdown occurs when an applied voltage of secondary power supply52 exceeds 1.2 to 30 times the applied voltage of primary power supply48.

In still another refinement of the present embodiment, plasma probes areinstalled between the cathode 28 and remote anode 44 to measure plasmadensity. Such measurements provide a feedback so that the second powersupply 52 is adjusted to provide adjusting a remote anode current toremote anode 44 to obtain a uniform distribution of the plasma densitybetween cathode chamber assembly 18 and remote anode 44.

Remote arc plasma modeling of the present embodiment is characterized bythe electric potential distribution between cathode chamber assembly 18and remote anode 44 and by the plasma density in the remote arcdischarge plasma. The plasma potential in the remote arc dischargeplasma and the anode potential increase as the remote discharge currentincreases. The plasma density in the remote arc discharge plasmaincreases almost proportional to the discharge current. This result isverified by optical emission spectroscopy of the remote arc dischargeplasma. FIG. 3 shows the intensity of the radiation emitted by excitedargon atoms (spectral line ArI 739.79 nm) from the remote arc dischargeplasma versus discharge current. It can be seen that the intensity oflight emission from the argon atoms excited by direct electron impact isnearly proportional to the discharge current. This phenomenon isexplained by the direct proportional relationship between electronconcentration in the remote arc plasma and the remote arc dischargecurrent. The ion concentration in the remote arc discharge is nearlyequal to the electron concentration such that plasma quasi-neutrality ismaintained.

With reference to FIGS. 4A, 4B and 4C, variations of the presentembodiment with a chain of magnetron sputtering sources installed inlinebetween a shielded cathode chamber assembly on one side and a distantarc anode on the other side is provided. In this context, the term“inline” means that the components are linearly arranged such that thesubstrates may pass over the components while moving in a lineardirection. FIG. 4A provides a schematic of a coating system havingadditional remote anodes positioned between the magnetron sputteringsource with additional shielded cathode chamber assemblies added tosecure the uniformity and high ionization of gaseous plasma environment.Deposition system 70 includes vacuum chamber 72 with associated vacuumand gas supply systems as set forth above. Deposition system 70 alsoincludes vapor sources 76 and 78, cathode chamber assemblies 80 and 82,and substrate holder 84 to hold substrates 22 to be coated. FIG. 4Adepicts a variation in which vapor sources 76, 78 are magnetronsputtering sources. The substrates are positioned in front of the vaporsources during coating. Typically, substrates 22 move along direction d1during deposition of the coating. Cathode chamber assemblies 80 and 82,respectively, include cathode enclosures 90 and 92 with openings 94 and96 defined therein, cathodes 98 and 100, optional primary anodes 102 and104, and shields 106, 108. Shields 106, 108 respectively isolatecathodes 98, 100 from vacuum chamber 72. Shields 106, 108 each defineopenings for transmitting electron emission currents into vacuum chamber72. In a refinement, cathodes 98, 100 are cathodic arc cathodes andprimary anodes 102, 104 are cathodic arc anodes. System 70 also includesremote anodes 110, 112, respectively, electrically coupled to cathodes98, 100. In a refinement as depicted in FIG. 4A, the shielded cathodechamber assemblies, the vapor sources (e.g., magnetron targets) and theremote anodes are aligned along the straight line which is suitable forthe in-line coating systems.

FIG. 4B provides a schematic illustration of a coating system whichincludes variable resistors installed between a master anode and each ofa plurality of slave anodes. In this refinement, coating system 120includes vacuum chamber 122 and cathode chamber assembly 124 which is ofthe general design set forth above. Cathode chamber assembly 124includes cathode chamber 126, cathode 128, arc igniter 130, shield 132defining a plurality of openings therein, and optional primary anode134. System 120 also includes primary power supply 136 which connectscathode 128 and primary anode 134 and magnetron sputtering sources 136,138, 140. Each magnetron sputtering source has a target Ts, a powersupply Ps and an associated counter-electrode system 120 which alsoincludes remote anode 142 with secondary power supply 144 providing avoltage potential between cathode 128 and remote anode 142. System 120also includes slave anodes 146, 148, 150, 152 which are at intermediatevoltage potentials established by variable resistors R¹, R², R³, and R⁴.In this refinement, the density of the plasma distribution can becontrolled by changing the current through each of the slave anodesusing variable resistors R¹, R², R³, and R⁴. The distances between theslave anodes and the distance between the slave anode closest to themaster anode and the master anode cannot be greater than the minimaldistance of the plasma discharge interruption in a processing gascomposition and pressure.

FIG. 4C provides a refinement in which a resistor in parallel with acapacitor is used to set the voltage potentials of the intermediateanode. In this refinement, resistor R⁵ in parallel with C⁵ sets thevoltage potential for anode 146, resistor R⁶ in parallel with C⁶ setsthe voltage potential for anode 148, resistor R⁷ in parallel with C⁷sets the voltage potential for anode 150, and resistor R⁸ in parallelwith C⁸ sets the voltage potential for anode 152. In this refinement,the capacitors are used to extend the RAAMS process along the largedistance by pulse igniting of the remote arc discharges between thecathode in a cathode chamber and each of the slave anodes positionedbetween the cathode in a cathode chamber and the master anode. It isappreciated that slave anodes can be also provided with additionalindependent power supplies; each of the slave anode power supply can beinstalled between the cathode 128 and the corresponding slave anode. Theopen circuit voltage of each secondary power supply connected either tothe master anode or to the slave anode exceeds at least 1.2 times theopen circuit voltage of the primary arc power supply 136.

In still another variation of the invention, an inline modularconfiguration of the RAAMS setup is provided in FIG. 5. Such an inlinesystem may include any number of deposition stations and/or surfacetreatment stations (e.g., plasma cleaning, ion implantation carburizing,nitriding, etc.). In the variation depicted in FIG. 5, coating system154 includes modules 156-164 which are aligned inline. Modules 156-164are separated from the neighboring module by load-lock gate valve166-176. Modular RAAMS surface engineering system 154 includes module156 which is a chamber-module having a shielded cathodic arc chamber 178and a remote anode 180 positioned along one wall of the chamber as setforth above. An optional set of magnetic coils 182, 184 which create alongitudinal magnetic field ranging from 1 to 100 Gs along the coatingchamber is also shown in this Figure. This module 156 performs thefollowing operations: substrate loading; ion etching or ion cleaning ofthe substrates by high energy (typically E>200 eV) ion bombardment in anargon with a remote anode arc discharge (RAAD) plasma generated betweenthe cathode in a shielded cathode chamber and a remote anode; andconditioning of the substrates to be coated by soft ion bombardment(typically E<200 eV) in an argon RAAD plasma generated between thecathode in a shielded cathode chamber and a remote anode. Second module158 ionitrides the substrate surfaces to be coated in nitrogen orargon-nitrogen mix RAAD plasma generated between the cathode in ashielded cathode chamber and remote anode. The rate of plasma immersionionitriding of HSS, M2 and 440C steel in the RAAD plasma immersionionitriding process reaches 0.5 to 1 μm/min at pressures from 0.1 mtorrto 200 mtorr and a remote anode current ranging from 10 to 300 amps, buttypically within the pressure range 0.2-100 mtorr and remote anode rangefrom 10 to 200 amps. The RAAD plasma immersion ionitriding is a lowtemperature treatment where substrate temperature typically does notexceed 350° C. In this process, the substrates may be floating, groundedor biased at very low negative bias voltages (e.g. below −100V).Ionitriding at such low bias voltages is due to the high positive RAADplasma potential causing the plasma ions to receive excessive energyfrom the high plasma potential which exceeds the grounded substratepotential. Alternatively, a low energy ion implantation of such elementsas nitrogen, phosphorus, silicon, carbon from the gaseous RAAD plasmacan be also performed at relatively low substrate bias voltagestypically ranging from −200 to −1500 volts. The diagram of potentialdistribution in RAAD plasma processing is illustrated in FIG. 6. In atypical RAAD plasma process, the primary cathode has potential rangingfrom −20 to −50 volts relative to the ground primary anode. In arefinement, the floating substrate potential ranges from −10 to −50volts relative to the primary cathode. The biased substrate potential inionitriding, carburizing and other ion diffusion saturation processes istypically from −10 to −200 V relative to the primary cathode, while inthe RAAD plasma immersion low energy ion implantation process, thesubstrate bias is typically from −200 to −1500 volts.

It is appreciated that the modular chamber layout of FIG. 5 can also beused to perform remote anode arc plasma assisted CVD (RAACVD) processesin gaseous RAAD plasma chambers (for instance, modules 156, 158 and 164in FIG. 5). For example, this low pressure plasma immersion CVD processsetup can be used for deposition of polycrystalline diamond coatings inthe plasma-creating gas atmosphere consisting 0.1-1% methane and balancehydrogen or hydrogen—argon mix. RAAD plasma acts as a powerful activatorof the reactive atmosphere with high density of atomic hydrogen and HCradicals which are contributing to formation of polycrystalline diamondcoating. In this process the substrate to be coated can be eithergrounded, floating or biased to the negative potential not below −100volts vs. the primary cathode. Independent radiation heater array can beused to maintain substrate temperature in the range from 200° C. to1000° C. as necessary for the deposition of polycrystalline diamondcoating in the plasma enhanced low pressure CVD processes.

In another embodiment, a coating system having plasma sources alignedalong curvilinear walls is provided. FIG. 7A provides a schematic topview of a batch coating system with a centrally located shielded cathodechamber. FIG. 7B provides a schematic perspective view of the batchcoating system of FIG. 7A. Coating system 190 includes vacuum chamber192, cathode chamber 194 which includes cathode 196, and shield 198.Vacuum chamber 192 has a substantially circular cross section. System190 also includes primary power supply 170 which sets the voltagepotential between cathode 196 and primary anode 202. System 190 alsoincludes magnetron sputtering sources 204-210 each of which includestarget Ts, power supply Ps, and anode As. In a refinement, magnetronsputtering sources 204-210 are arranged along a circle having the samecenter as the cross section of vacuum chamber 192. System 190 alsoincludes remote anodes 212 and 214 which are set at a voltage potentialrelative to cathode 194 by power supplies 216 and 218. In thisembodiment, substrates 22 move axially along a circular direction d2 asthey are coated. In each of the variations of FIGS. 7A and 7B, theplasma streams between cathode 196 and the remote anodes. This streamingis confined by the separation between the remote anode (or sputteringsources) and the substrates (i.e., top of the substrates) which istypically 2 to 20 inches. The confinement persists through the coatingzone. Moreover, the plasma is rastered along the cathode in a directionperpendicular to the movement of the substrates as set forth above withrespect to FIG. 1D.

As set forth above, remote anodes 212 and 214 have a linear remote anodedimension Da. Magnetron sputtering sources 204-210 have linear sourcedimension D_(s). Cathode target 196 has a linear cathode targetdimension D_(c). Substrate holder 20 has a linear holder dimensionD_(h). In a refinement, the linear remote anode dimension D_(a), thelinear cathode target dimension D_(c). and the linear holder dimensionD_(h) are parallel to each other. In another refinement, the linearremote anode dimension D_(a) is greater than or equal to the linearcathode target dimension D_(c) which is greater than or equal to thelinear holder dimension D_(h).

It is appreciated that an external magnetic field can be applied in acoating chamber for the embodiments set forth above to further enhancethe plasma density during arc plasma enhanced magnetron sputteringcoating deposition processes. The preferable magnetic field will havemagnetic field lines aligned generally parallel to the cathodic arcchamber and/or remote anode. This will contribute to the increase of thearc discharge voltage and, consequently, to the electron energy and arcplasma propagation length along the coating chamber. For example, theexternal magnetic field can be applied along the coating chambers in theinline coating system shown in FIG. 5.

A uniform plasma density distribution in the coating chambers set forthabove can be achieved by appropriately distributing both remote anodesand the electron emitting surface of the shielded vacuum arc cathodetargets to evenly cover the coating deposition area. For example, ifcoating deposition area is 1 m high then both electron emitting surfacesof the shielded cathode target and electron current collecting remoteanode surfaces have to be distributed to evenly cover this 1 m highcoating deposition area. To achieve these requirements, several smallcathode targets can be installed in a shielded cathode chamber, each ofthe cathode targets is connected to the negative pole of the independentpower supply. The cathode targets are distributed generally evenly sothe electron flows emitted by each of the cathode targets overlapoutside the shielded cathode chamber providing a generally evendistribution of electron density over the coating deposition area. Thepositive poles of the remote arc power supplies can be connected to onelarge anode plate having the height generally the same as a height ofthe coating deposition area and facing the substrate holder withsubstrates to be coated as shown in FIGS. 1 and 4-6. The set of anodeplates, each connected to the positive pole of the remote arc powersupplies, can be used to provide even distribution of electron densityover the coating deposition area. Similarly, instead of using a set ofsmall cathode targets in a shielded cathode chamber, a single largecathode target having a linear dimension similar to the linear dimensionof the coating deposition area can be used as a cathode of remote arcdischarge. In this case, electron emission spots (i.e., cathodic arcspots) are rastered over the cathode target to provide a generally evendistribution of electron emission current over the coating depositionarea. The rastering of the cathodic arc spots over a large cathodetarget area can be achieved, for example, by magnetic steering of thecathodic arc spots over the arc evaporating area of the cathode targetor by mechanical movement.

With reference to FIGS. 8A-8H, schematic illustrations depicting arefinement of coating system of FIGS. 7A and 7B which uses amagnetically steered cathodic arc spot is provided. The presentvariation incorporates features from U.S. Pat. No. 6,350,356, the entiredisclosure of which is hereby incorporated by reference. Referring toFIG. 8A, system 190′ includes duct magnetic coil 270 surrounding plasmaduct 272 which is formed within cathode chamber 194 between the twoopposite sides of the housing 274. Coil 270 includes winding 270A facingside 196A of the cathode target 196 and an opposite winding 270B facingside 196B of the cathode target 196. Cathode target 196 is generally barshaped with a long dimension d_(A). Duct coil 270 generates a magneticfield along the duct 272 with magnetic force lines generally parallel tothe sides 196A and 196B of the cathode target 196. When cathodic arcspot 278 is ignited on the evaporating surfaces 196A or 196B, arc spot278 moves along a long side of the bar-cathode 196. At the end of thebar, arc spot 278 switches sides and continues its movement in theopposite direction at the opposite side of the bar. Isolation ceramicplates (not shown) attached to the sides of the cathode barperpendicular to the magnetic force lines prevent the arc spot escapingfrom the evaporating surface of the cathode 196. Shields 198 areoptionally installed at the ends of the plasma duct 272 facing thecoating area in the coating chamber 192. In a refinement, shields 198are movable to permit opening and closing the plasma duct 272 dependingon the stage of the coating process. When shields 198 are closed theRAAMS process can be conducted with enhance ionization of the magnetronsputtering environment by the RAAD plasma. When the ends of the duct 272are opened, the cathodic arc plasma flows along the magnetic force linesgenerated by duct coil 270 toward substrates 22 to be coated whichresults in deposition of cathodic arc coatings from the cathodic arcmetal vapor plasma which is magnetically filtered from undesirableneutral metal atoms and macroparticles. The filtered cathodic arccoating deposition may be conducted as a single process phase or inconjunction with magnetron sputtering by the magnetron sputteringsources 204-210. The ionization and activation of the plasma environmentby the remote arc discharge established between the cathode 196 in thecathode chamber 194 and the remote anodes 210, 214 improves the density,smoothness and other physic-chemical and functional properties of thecoatings.

Referring to FIGS. 8B and 8C, schematic illustrations depicting themechanism of magnetic steering of the cathodic arc spots around anelongated rectangular bar cathode are provided. Rectangular bar-shapedcathode 196 is positioned between two portions of duct coil windings270. Left winding 270 a and right winding 270B face the evaporatingsides of the cathode 196. Cathode side 196A faces duct coil winding side270A while cathode side 196B faces duct coil winding side 270B. Themagnetic field B generated by the duct coil windings 270 is parallel tothe sides of the cathode 196 facing the duct coil winding and at thesame time is perpendicular to the axis d_(A) of the elongated cathode196 (i.e. the long sides of the cathode target 196). When cathodic arcspot 278 is ignited on a side of the cathode 196 facing the duct coilwinding arc, current I_(arc) is generated perpendicular to the surfaceof the cathode target 196 and, therefore, perpendicular to the magneticforce lines B generated by duct coil 270. In this case, the cathode arcspot moves along the long side of the cathode with the average velocityV_(arc), which is proportional to the Ampere force defined by a productof arc current I_(arc) and magnetic field B, following the well-knownAmpere law:V _(arc.)=(−/+)c*I _(arc) *B,  (1)where c is a coefficient which is defined by the cathode material. Thedirection of the arc spot movement (the sign in the parenthesis in theabove formulae) is also determined by the cathode target material sincethe magnetic field generated by the duct coil 270 is parallel to foursides of the cathode target (i.e., long in the same direction around theevaporative sides of cathode target 196). For example, when the cathodearc spot 278A is created on cathode side 196A facing the duct coilwinding 270A, the arc spot moves down the cathode target 196 along thelong side 196A. At the end of the cathode bar, the arc spots turn to theshort side 196D followed by turning to the long side 196B and thencontinuing up along long side 196B, etc.

FIG. 8C depicts the arc spots moving along the evaporative sides 196 a,196 b, 196 c and 196 d of the cathode target 196, which are parallel tothe magnetic force lines 280 generated by the duct coil 270. The ductcoil is energized by the duct coil power supply 282 while arc powersupply 284 is connected to the cathode target 196. The duct coilincludes coils 270 a and 270 b connected by an electric circuitincluding current conductors 286, 288, 290 and 290. The sides of thecathode target 196 perpendicular to the magnetic force lines are coveredby the isolation plates 294 which prevent arc spots from escaping theevaporative surface of cathode target 196. Cathodic arc plasma istrapped by the magnetic force 280 generated by the duct coils 270A and270B which prevent plasma diffusion across magnetic force lines 280,while plasma can freely move along the magnetic force lines 280.

FIG. 8D provides additional details regarding the steering of cathodicspots by the duct coil. The magnetic field generated by the duct coil270 steers the cathodic arc spots along the sides of the cathode targetbar 196 parallel to the magnetic field force lines as set forth above.The direction of the movement of the cathodic arc spots is shown by thearrows A_(D). The ends of the plasma duct 272 are opened which allowsthe cathodic metal vapor plasma to flow along magnetic force linestoward substrates 22 installed on substrate holder 20 in the coatingchamber. The neutrals and macroparticles are trapped within the cathodechamber on the inner walls of the duct 272 yielding near 100% ionizedmetal vapor plasma to enter in the coating area outside of the plasmaduct 272. This design of the cathode chamber is essentially that of afiltered cathodic arc metal vapor plasma source capable of getting ridof macroparticles and neutrals in the outcoming metal vapor plasma andyielding nearly 100% atomically clean ionized metal vapor for depositionof advanced coatings. The RAAD plasma established between the cathode196 and the remote anodes 212, 214 enhances ionization and activation ofthe plasma environment in the RAAMS coating deposition process,resulting in improved coating properties. In this design, the hybridcoating deposition processes can be conducted as a single cathodic arcor magnetron coating deposition or as a hybrid process combiningcathodic arc metal vapor plasma with magnetron metal sputtering flowimmersed in a highly ionized remote arc plasma environment.

Still referring to FIG. 8D, the issue of arc plasma enhancement of largearea magnetron sputtering coating deposition process and hybridprocesses is addressed by positioning at least one remote arc anode offline-in-sight with the cathode target bar 196. In this variation, atleast one substrate 22 held by substrate holder 20′ and magnetronsputtering sources 204-210 are positioned in a coating chamber regionoutside of the plasma duct 272. The present RAAMS process effectivelyimmerses the metal sputtering flow generated by conventional magnetronsources in the dense and highly ionized remote anode arc discharge(RAAD) gaseous plasma. The remote arc power supply (not shown) whichpowers the RAAD plasma is installed between the arc cathode target 196and the at least one remote anode 212. The remote anodes 212, 214provide at least 20% higher open circuit voltage than the power supplywhich powers the primary arc discharge in a cathode chamber which isignited between the arc cathode 196 and the proximate anode. Theproximate anode can be an inner wall of the plasma duct enclosures 296A,296B or, optionally, an independent anode electrode within plasma duct272. In another refinement, several additional remote anodes, each ofthem associated with at least one arc cathode positioned within plasmaduct 272, may be utilized. The remote anodes are positioned at strategicpositions within the coating chamber between the end-openings of theplasma duct 272 off line-in-sight from cathode 196. The minimal distancebetween the end-openings of the plasma duct 272 and the remote anodes212, 214 must be less than the plasma discharge breakdown distance whenthe voltage applied between the cathode and remote anode exceeds 1.2 to10 times the voltage drop between the cathode and the primary(proximate) anode, which can be either electrically grounded orisolated.

FIG. 8E depicts a variation of the coating system of FIG. 8A-8D whichutilizes a macroparticle filter are provided. The design of thisvariation incorporates the advanced macroparticles filter of U.S. Pat.No. 7,498,587 and EU Patent Application No. EP 1 852 891 A2, the entiredisclosures of which are hereby incorporated by reference. System 190′includes trimming coils 300 a and 300 b positioned adjacent to theopposite sides of the cathode target 196 and facing opposite sides ofthe plasma duct 272. The inner walls of the opposite ducts 296A and 296Bare provided with grooves or, optionally with baffles for trappingmacroparticles. Duct coil 272 surrounds duct 272 with winding portion270A being parallel to the long side of the cathode target 196A whilefacing duct side 296A. Similarly, winding portion 270B is parallel tothe long side of the cathode target 196 b and faces duct side 296 b.Trimming coils 300A, 300B include magnetic cores 302 which aresurrounded by electromagnetic coils 304. The cathodic arc spots movealong the evaporation sides 196A and 196B of the cathode target 196under influence of the Ampere force according to the expression (1) setforth above. The sides of the cathode target 196 perpendicular to theplane of symmetry of the duct 272 are covered by ceramic isolationplates 294A and 294B to prevent arc spots from escaping the evaporatingsurface of the cathode target 196. The direction of the magnetic fieldgenerated by the trimming coils 300A, B coincides with the direction ofthe magnetic field generated by the duct coil 270. However, in thevicinity of the evaporating surfaces of the cathode target 196A or 196B,the magnetic force lines generated by trimming coils 300A, B arearch-shaped thereby allowing confinement of the cathodic arc spotswithin the evaporation area of the cathode target as require by thewell-known acute angle rule (see for example, R. L. Boxman, D. M.Sanders, and P. J. Martin, Handbook of Vacuum Arc Science andTechnology. Park Ridge, N.J.: Noyes Publications, 1995 pgs. 423-444).

FIGS. 8F, 8G and 8H provide schematics illustrating the mechanism of arcconfinement by the magnetic field generated by the trimming coils 300A,B. Cathodic arc spots 278 are located under a top point of thearch-shaped magnetic force lines as required by the acute-angle rule ofarc spot confinement. The magnetic field with the arch-shapedconfiguration above the evaporating surface of the cathode target 196 isgenerated between the South pole of the trimming coil 300A and the Northpole of the trimming coil 300B on both sides of the cathode target 196facing the duct 272. The configuration of the magnetic field withinplasma duct 272 is evaluated using numerical calculation. The magneticfield with plasma duct 272, when both duct coil 270 and trimming coils300 are turned ON, generates a magnetic field in the same direction isshown in FIG. 8G. This figure demonstrates that the magnetic force linesare directed in the same direction while still having an arch-shapedconfiguration in the vicinity of the evaporation surface of the cathodetarget 196. In this mode, the cathodic arc plasma magnetically filteredfrom the neutral metal atoms and macroparticles flows along the magneticforce lines away from the plasma duct 272 toward substrates to be coated(not shown) in the coating area of the coating chamber outside of theplasma duct 272. In this filtered cathodic arc deposition mode, thenearly 100% ionized metal vapor plasma with little, if any, neutralmetal atoms or macroparticles is deposited onto substrates therebycreating defect-free coatings with superior properties. The magnetronsputtering coatings can also be deposited during this mode of operationby the magnetrons positioned on the outer walls of the plasma duct 272.Additional ionization and activation of the coating deposition plasmaenvironment during this mode of operation is provided by the remote arcdischarge established between cathode 196 and remote anodes 212, 214positioned next to the magnetrons on the outer wall of the plasma duct272 or, alternatively, on the inner wall of the coating chamber oppositeto the magnetron sources (not shown). Referring to FIG. 8H, the magneticfield force lines are shown to switch directions within the plasma ductwhen duct coil 270 is turned “OFF”. However, when both trimming coils300A, B are turned “ON” an arch-shaped magnetic field is generated abovethe evaporative surface of cathode target 196. Depending on theoperating mode, the deflecting magnetic field generated by deflectingduct coil 270 can be turned “ON” or “OFF”. When the magnetic field ofthe deflecting duct coil 270 is turned “ON”, the metal vapor plasmagenerated by the cathode target 196 is transported bi-directionallythroughout the plasma duct 272 towards substrates 20. When thedeflecting duct coil 270 is turned “OFF”, the metal vapor plasmagenerated by the cathode target 196 does not transport towardssubstrates 20, although the cathode arc spots continue their movementaround the target bar 196 driven by the steering magnetic fieldgenerated by trim coils 300A, B. In this variation, the duct coil worksas a magnetic shutter eliminating the need in a mechanical shutter orshield as shown in FIG. 7A. When the magnetic shutter is “ON,” the metalvapor is transported through the plasma duct toward substrates 20 in theprocessing chamber. When the magnetic shutter is “OFF”, the magneticshutter is closed and metal vapor does not reach substrates 20. FIG. 7Hshows the distribution of the magnetic field in plasma duct 272 is zerowhen the current of the duct coil is set to zero and the trim coilscurrent set to 0.1 amperes and duct coil current is zero. It can be seenthat when the magnetic field of duct coil 270 is zero, there is nomagnetic field to transport metal vapor plasma away from the plasma duct272, although trim coils 300 a, 300 b still generate a magnetic fieldwith an arch-shaped geometry that is sufficient both for confinement ofthe arc spots 278 within evaporating area of the target 196 (magneticarch configuration at the evaporating target surface) and for steeringthe arc spot movement around the cathode bar 196. In this latteroperation mode, when cathodic arc metal vapor plasma is trapped withinthe plasma duct, the electrons still flow away from the plasma ducttoward remote anodes positioned outside of the plasma duct 272 in thecoating chamber. The resulting remote arc discharge is establishedbetween cathode 196 in the plasma duct 272 and the remote anodes (notshown) which can be positioned in the outer wall of the plasma duct 272or in the wall of the coating chamber in a position opposite to themagnetron sources (not shown). The RAAD plasma enhances ionization andactivation of the coating deposition processing environment in thecoating chamber, resulting in deposition of advanced coatings withsuperior properties.

When the magnetic shutter is closed, cathode target 196 still generatesa large electron current which can be extracted toward remote anodes toestablish a remote arc assisted discharge plasma in the processingchamber. The RAAD plasma is characterized by high density, ranging from10¹⁰-10¹³ cm⁻³, high electron temperature ranging from 3 to 20 eV, andhigh plasma potential which generally resembles the potential of theremote anode. An experimental study confirms that the magnetic shuttercan seal the plasma duct 272 thereby preventing metal vapor plasma fromreaching the substrates 20 when the magnetic shutter is closed. Cathodetarget bar 196 used in these experiments was made of stainless steel.The silicon wafers which are used as substrates 20 are installed onsubstrate holding shafts of the round table substrate holder which isrotated at 5 RPM during 2 hours of the coating deposition process. Thecurrent of trim coils 300 is set at 0.2 A while the duct coil 270current is set to zero. The argon pressure is 1.5 mtorr while thecurrent of the primary arc is 140 amperes. After a two hour exposure,the substrates are unloaded and the coating thickness is measured bymeans of optical interferometry using Veeco NT3300 Optical Profiler. Theresults are presented in Table 1 below.

TABLE 1 Measurement Thickness (nm) Si chip Thickness (nm) Si wafer 1 1115 2 12 8.5 Average 11.5 11.75 Combined Average 11.625

From the results presented in Table 1, it follows that the depositionrate on a rotating substrate holder does not exceed 6 nm/hr when themagnetic shutter is closed. The average coating thickness produced in acoating deposition process, either by filtered cathodic arc depositionor magnetron sputtering sources, typically exceeds 1 nm/hr. In thiscase, leakage of the metal vapor does not increase doping elements in acoating over the usual level of impurity of the cathode targets used inindustrial coating deposition processes.

The following processes can be conducted in a remote arc assistedsurface engineering (RAASE) chamber:

ion cleaning/etching in dense RAAD plasma (magnetic shutter is closed);

low temperature ion nitriding or oxi-nitriding, plasma carburizing. Thetemperature of substrates during this process can be as low as 150° C.The ionitriding rate of M2 steel in RAAD nitrogen plasma is typicallyranging from 0.1 to 0.5 μm/min. (magnetic shutter is closed);

low energy ion implantation (the substrate bias below 2 kV) (magneticshutter is closed);

deposition of filtered arc coatings (magnetic shutter is open;

deposition of magnetron sputtering coating by remote arc assistedmagnetron sputtering (RAAMS) process (magnetic shutter is closed); and

deposition of magnetron sputtering coatings modulated by filtered arccoatings (magnetic shutter OFF/ON as per duty cycle to achieve arequired coating modulation period).

With reference to FIG. 9A-E, schematics of a filtered arc assistedmagnetron sputtering (“FAAMS”) hybrid filtered arc-magnetronbi-directional system having additional magnetron sources are provided.In this variation, additional magnetron sputtering sources 310-316 arepositioned adjacent to the arc cathode chamber 194 magnetically coupledwith filtered arc source 196 and having the magnetron targets forming anopen angle in the range from 10 degrees to 80 degrees. This openingangle Ao assists in focusing the magnetron sputtering flow toward thesubstrates. In this filtered arc assisted magnetron sputtering hybridcoating deposition process, the filtered arc metal plasma flows alongthe magnetic field lines of the transporting magnetic field created bythe duct coil 270. Moreover, the magnetic field lines diverge at theexit of the plasma duct 272. This results in metal ions from thefiltered arc cathode passing by the magnetron sputtering target areaclose to the target surface and crossing a magnetron discharge area withlarge close-loop magnetic field topology. A substantial portion of thesemetal ions are trapped in the magnetron magnetic field and contribute tothe sputtering of the magnetron target, which can occur even withoutsputtering gas (argon or other noble gas) and within a broadenedpressure range from 10⁻⁶ to 10⁻² torr. Another portion of the metal ionsgenerated by filtered arc cathodes continue towards substrates 22 wherethey mix with the focusing magnetron sputtering flow, providing anionized metal fraction of the magnetron sputtering coating depositionprocess. It is well-known that increasing the ionization rate of themetal vapor improves coating adhesion, density, and other mechanicalproperties, and smoothness.

FIG. 9B provides additional features of the FAAMS hybrid filteredarc-magnetron bi-directional source. Optional additional focusingmagnetic coils 320 are positioned opposite to the exit opening of theplasma duct which provides additional improvement of the plasma densityand controls mixing of the magnetron sputtering flow with filtered arcmetal plasma flow focusing toward substrates to be coated in a coatingchamber (not shown). In addition, optional focusing magnetic coils 324are positioned about magnetron targets 310-316 at the exit portion ofthe plasma duct 272. Focusing coils 324 improve the concentration of theplasma density near the magnetron targets. The direction of the magneticforce lines generated by these coils at the side adjacent to the ductcoil have the same direction as the transporting magnetic fieldgenerated by the duct coil. FIG. 9C provides a schematic illustration ofa refinement of the system of FIG. 9B. In this refinement, pairs ofmagnetic focusing coils 328 are positioned at the exit portion of theplasma duct surrounding the plasma duct on both sides of the magnetronsources. FIG. 9D provides a top cross section of the coating systems ofFIGS. 9A-C, in which the remote arc plasma (F1), the magnetronsputtering flows (F2), and the filtered arc plasma stream (F3) aredepicted. The direction of the magnetic field generated by thesefocusing coils coincide with the direction of the transporting magneticfield generated by the duct coil. FIG. 9E provides yet another variationof a coating system. FIG. 9E depicts a section coating chamber 192outline with the rotating substrate holding turntable 22 with substratesto be coated 20. The cathode chamber 194 is positioned opposite to thesubstrates to be coated 20 in the coating chamber 192. The primary arcdischarge in a cathode chamber 194 is ignited by the striker 440 oncathode target 196 which are enclosed within the housing 274. Thehousing 274 has a shield 198 with openings which are not transparent forheavy particles such as ions, atoms and macroparticles emitted from thesurface of cathode target 196, but allow electrons to flow freely towardthe remote anodes in the coating chamber 192. The magnetron targets 310,312 are positioned adjacent to the cathode chamber shield 198 so thatthe sputtering flow emitted from the magnetron targets is coupled withhighly ionized plasma in front of the shield 198 and focusing towardsubstrates 20 in the coating chamber 192. In this arrangement thecathodic portion of the remote arc plasma generating in front of thecathode shield 198 is coupled with magnetron sputtering flow resultingin substantial increase of ionization and activation of themetal-gaseous plasma generating by the magnetron targets 310, 312 whichcontributes to further improvement of coating adhesion, density,smoothness, reduction of the defects and improvement of their functionalproperties for different applications.

The FAAMS surface engineering system can operate in the following modes:

RAAD plasma immersion ion cleaning, ion nitriding, low energy ionimplantation. In this mode the cathodic arc source is operating, bothtrim coils are ON, but the plasma transporting duct coil is OFF. TurningOFF the duct coil effectively prevents the metal plasma generated by thecathode positioned in a center of the plasma duct for reaching out ofthe plasma duct toward substrates to be coated in a coating chamber, butthe gaseous dense and highly ionized RAAD plasma is filling the entireprocessing chamber including the interior of the plasma duct and thearea in a chamber where substrates to be coated are positioned on thesubstrate holder. This dense gaseous plasma provides a highly ionizedenvironment for plasma immersion ion cleaning, ion nitriding (as well asion carburizing, oxi-carburizing, boronizing and other ion saturationprocesses) and low energy ion implantation. It can also be used forremote arc assisted CVD (RAACVD) processes, including deposition of adiamond-like carbon (DLC) coating when the hydrocarbon contained gaseousatmosphere is created in a coating chamber. In this mode, the remote arcplasma assisted CVD process can be conducted. Moreover, it is possibleto deposit polycrystalline diamond coatings when substrates are heatedto a deposition temperature ranging from 500 to 1000° C. (depending ontype of substrate). In such a process, the gas pressure is typicallyranging from 1 to 200 mTorr, the gas atmosphere typically includes0.1-2% of methane in hydrogen at a hydrogen flow rate ranging from 50 to200 sccm depending on pumping system capability with the balance beingargon. The duct coil works as a magnetic shutter, effectively closingthe way out of the metal plasma generated by the cathode in a plasmaduct, while opening the way for the RAAD generated gaseous plasma.

When the duct coil is OFF (magnetic shutter is closed) and RAAD plasmais created within the coating chamber between the cathode in plasma ductand remote anode(s) in a coating deposition area outside of the plasmaduct, the highly ionized plasma environment can be used for plasmaassistant magnetron sputtering (RAAMS) processes. In this case, themagnetron sources positioned outside of the plasma duct in a coatingarea are turned ON and magnetron sputtering process is conducted in ahighly ionized RAAD plasma environment. In this process, theproductivity of the magnetron sputtering increases more than 30% and thecoating is densified by the ion bombardment of the substrate surface bygaseous plasma-born ions.

When the plasma duct coil is ON, the magnetic shutter is open and metalplasma generated by the cathode in a plasma duct is flowing into thecoating deposition area along the magnetic force lines of thetransporting magnetic field generated by the duct coil. The filtered arcmetal plasma can be used for deposition of the variety of coatings,including super hard hydrogen free tetrahedral amorphous carbon (ta-C)coating when graphite bar is used as a cathode target in a plasma duct.When magnetron sources positioned in the exit portion of the plasma ductand having their targets facing the substrates are turned ON, the hybridfiltered arc assisted magnetron sputtering (FAAMS) process starts. Inthis case, the filtered arc metal plasma which is 100% ionized ispassing the magnetron sources mixing with the magnetron sputteringatomic metal flow which generally has a low ionization rate of <5%. Themixed filtered arc metal plasma and magnetron sputtering atomic metalflow is directed toward substrates in a coating area in front of theexit of the plasma duct, which provide hybrid filtered arc assistedmagnetron sputtering coating deposition with high and controllableconcentrations of the depositing metal atoms flow.

FIG. 10 provides a schematic description of the physical processes whichare involved in the bi-directional remote arc discharge of the presentinvention. The primary arc is initiated by an arc igniter on a surfaceof cathode target 196 isolated from the discharge chamber by the pair oftrimming coils 300. This source can work in two modes: first, in acoating deposition mode when the arc vapor plasma is transported alongthe magnetic force lines of the longitudinal magnetic field created bythe duct coil 270 force; and second, in electron emission mode, when theduct coil is turned off and arc plasma is confined and magneticallyisolated from the processing chamber by the magnetic field created by apair of trimming coils 300. The plasma potential within the plasma duct272 is low, close to the potential of the proximate anode, which is inmost cases grounded, while in the remote arc discharge plasma theelectric potential is high, close to the potential of the remote anode214. The typical distribution of the plasma potential between the plasmaduct 272 and the remote anode 214, obtained by finite element modelingis shown in FIG. 2.

With reference to FIG. 11, a schematic of a batch coating system with aperipherally located shielded cathode chamber assembly is provided.Coating system 330 includes vacuum chamber 332, cathode chamber assembly334, which includes cathode chamber 336, cathode 338 and shield 340.System 330 also includes primary power supply 342 which sets the voltagepotential between cathode 338 and primary anode 344. System 330 alsoincludes magnetron sputtering sources 356-366 each of which includestarget Ts, power supply Ps, and anode As. System 330 also includesremote anode 360 which is set at a voltage potential relative to cathode338 by power supply 362. In this embodiment, substrates 22 move axiallyalong direction d3 as they are coated.

FIG. 12 illustrates a further variation providing a shielded cathodicarc electron emission source located in the center of the coatingchamber. In particular, the present variation provides a circular batchcoating system 380 with cathode chamber assembly 382 located in itscentral area. The cathode 384 is positioned within the cathode chamberassembly 382 generally along the axes of the coating system 380. Cathodechamber assembly 382, respectively, include cathode enclosures 388 withopenings 390 and 392 defined therein, cathode 384, optional primaryanodes (not shown), and shields 396, 398. The enclosure 388 and shields396, 398 respectively isolate cathode 384 from vacuum chamber 400 andcan also serve as a primary anode for the arc discharge ignited in acathode chamber 382. The primary arc power supply is also providedbetween the cathode 384 and the anode-enclosure 388 (not shown). Theenclosure 388 and shields 396, 398 each define openings for transmittingelectron emission currents into vacuum chamber 400, while at the sametime serving as a barrier stopping the heavy particles such as metalvapor atoms, ions and macroparticles, emitted from the cathode 384 toreach substrates 20 to be coated in the coating chamber 400. Themagnetron sputtering sources 402, 404, and 406 are attached to the wall408 of the chamber 400. The remote anodes 410, 412 and 414 arepositioned next to the corresponding magnetron sources, preferablysurrounding these sputtering sources. The substrates 20 are positionedon rotary table platform 420 at the distance d1 between the cathodechamber and magnetron sputtering targets. The distance from themagnetron target surface to the substrates 20 is typically ranging from4 to 10 inches. The remote arc power supplies 424, 426, and 428 areinstalled between the remote anodes 410, 412 and 414 and the centralcathode 384 in the cathode chamber 382. The cathode 384 can be athermionic filament cathode, but preferably the cold evaporative vacuumarc cathode can be used, which is not sensitive to the reactive plasmaprocessing environment which can contain chemically aggressive gasessuch as methane, oxygen and nitrogen for coating deposition of carbides,oxides and nitrides. Cathode 384 is either elongated thermionic filamentor a cold cathode in a form of elongated metal bar or rod. Moreover,cathode 384 is positioned within the cathode chamber 382 along the axesof the coating chamber 400 with its electron emission zone lengthparallel and generally dimensionally equal to the height of thesubstrate 20 loading zone. Moreover, cathode 384 has a long dimensionthat is either less than or equal to the height of the remote anodes310, 312 and 314. The heights of the magnetron targets are also eitherless than or equal to the height of the remote anodes.

In a refinement, the magnetrons 402, 404, 406 shown in FIG. 12, can bereplaced with planar heaters. The substrates to be coated can be placedat the heater surface, facing the center of the chamber where theshielded cathode chamber 382 is positioned with the cathode 384. In thiscase the substrates can be heated to 900° C. while at the same timehighly ionized remote anode arc plasma can be established in the chamber380 by remote anode arc discharge between the cathode 384 in a cathodechamber 382 and the remote anodes 536, 538, 540 positioned at the wallof the chamber 380. In this process, when gas atmosphere in a chamber380 is composed of a mixture of methane, hydrogen and argon at thepressure range from 1 mTorr to 200 mTorr and methane concentration inhydrogen ranging from 0.1 to 2 at. weight % the polycrystalline diamondcoatings can be deposited on substrates positioned at the heated surfaceof the heaters, heated to the deposition temperature ranging from 700 to1000° C.

With reference to FIG. 13, schematic illustrations of a systemincorporating an electron emitting vacuum arc cold cathode source areprovided. In particular, the present variation adopts the design of theelectron emitting vacuum arc cold cathode source of the system of U.S.Pat. No. 5,269,898, the entire disclosure of which is herebyincorporated by reference. Rod-shaped cathode 430 is mounted withincathode chamber 432, which serves as a primary anode for the vacuumcathodic arc discharge powered by the primary arc power supply 434.Cathode 430 is connected to the negative output of an arc power supply434, and the enclosure 436 of the cathode chamber 432 is connected tothe positive output of arc power supply 434. The positive output of theprimary arc can be optionally grounded as shown by the dashed line inFIG. 7D. An arc is struck repetitively by a striker 440, located at theend of cathode 430 that is opposite the connection to arc power supply434. A helical electromagnet coil 442 is mounted coaxially with thecathode 430 and serves to generate a solenoidal magnetic field with fluxlines substantially parallel to the cathode 430 axis, and having amagnitude proportional to the current furnished by a coil power supply446. One or more substrates 20, upon which a coating is to be deposited,are disposed surrounding the cathode chamber 432 and optionally mountedon a substrate holding turntable platform (not shown) which will providerotation of the substrates during deposition, if necessary, to achieve auniform coating thickness distribution thereon. An arc spot 450 and atypical trajectory 452 thereof resulting from the influence of theapplied magnetic field are also depicted. Arc spot travels all or partof the length of the cathode 430 toward the connection to arc powersupply 434 before being re-struck. The insulator 454 prevents movementof the arc spot 450 off the desired evaporable surface of cathode 430.Electromagnet coil 442 may be electrically isolated from the arccircuit, or it may comprise a part of the anode by connection thereto asindicated by the dotted line 458. The electromagnetic coil 442 mayalternatively serve as the sole primary anode for the primary arcdischarge in the cathode chamber 432, in which case the electromagneticcoil 442 is isolated electrically from the chamber 430 and connected tothe positive output of primary arc power supply 434, which isdisconnected from the cathode chamber 432. One or more magnetronsputtering sources 460 are mounted along the walls 462 of the chamber466 surrounded by the remote anodes 470. The remote anodes are connectedto the positive output of the remote arc power supply 472, while itsnegative output is connected to the cathode 430 in the cathode chamber432. The enclosure 436 of the cathode chamber 430 has openings 476covered by shields 478 to prevent the heavy particles (ions, neutralatoms and macroparticles) emitted by the cathode 430 from reaching thedeposition area outside of the cathode chamber 432, but the electronsare able to freely penetrate into the coating area throughout theopenings 476 between the enclosure 436 and shields 478. The remote arccurrent is conducting between the cathode 430 within the cathode chamber432 and remote anodes 470 surrounding the magnetron sputtering sources460 at the wall of the coating chamber 466. The remote anode isconnected to the positive output of the remote arc power supply 472,while the negative output of the remote arc power supply 472 isconnected to the cathode 430 in the cathode chamber 432. The remote arcionizes and activates the plasma environment during the magnetronsputtering coating deposition process, but can also serve as a source ofionization and creation of plasma environment in a coating area duringpreliminary ion cleaning of the substrates before the coating processstarts, as well as for the plasma immersion ion implantation,ionitriding and plasma assisted low pressure CVD coating depositionprocesses.

With reference to FIGS. 14A-14C, a schematic illustration of a variationof a coating system incorporating a macroparticle filter are provided.In this variation, the design of the cathode chamber of U.S. PatentPublication No. 2012/0199070 is adopted, the entire disclosure of thispatent application is hereby incorporated by reference. System 480includes cathode chamber 484 which is configured as a macroparticlesfilter. Cathode chamber 484 includes an even number of duct assembliessymmetrically positioned around elongated cathode 486. The variation setforth in FIGS. 14A and 14B includes four duct assemblies, i.e., ductassemblies 488, 490, 492, 494, which effectively form an enclosure 496around the cathode 486. The duct assemblies 488, 490, 492, 494 defineducts 500, 502, 504, 506 through which positively charged ions areguided from cathode target 486 to substrates 20. Duct assemblies 488,490, 492, 494 define a magnetic field for guiding a plasma. Ductassemblies each include support component 510 and baffle component 512for blocking macroparticles. In a refinement, baffle component 512includes protrusions 514 for enhancing the ability of filtering outmacroparticles. Electrical posts 516, 518 are used to connect to thefilter power supply so that the duct assemblies are electrically biasedfor repelling positively charged ions. When the duct assemblies 488,490, 492, 494 are positively biased in relationship to the cathode 486it is also serving as a primary anode for the primary arc dischargeestablished within the cathode chamber 484. The duct assemblies 488,490, 492, 494 can also be isolated and have a floating potential. Inthis case the arc steering electromagnetic coil (not shown) can serve asa primary anode to the cathode 486 for igniting the primary arcdischarge in the cathode chamber 484 as was explained above in relationto the embodiment of the invention shown in FIG. 14B. With reference toFIG. 14C a schematic perspective view of a cathode chamberenclosure-filter assembly 496 is provided. Filter assembly-cathodechamber enclosure 496 is made of a set of duct assemblies 488, 490, 492,494, which are parallel to the cathode 486, preferably having a shape ofa rod but which can also be made as a bar with any polygonalcross-section. During the filtered cathodic arc coating depositionprocess the filter is electrically activated by passing a current alongthe duct assemblies 488, 490, 492, 494 to establish a magnetic field.

Still referring to FIGS. 14A-14C, a magnetic field is optionally createdby passing a current through the duct assemblies so as to create amagnetic field. In particular, adjacent duct assemblies generatemagnetic fields with opposite magnetic polarities. Arrows 520, 522, 524,526 indicate an example of the directions that current may flow tocreate such magnetic fields. The arrows show that the directions of thecurrents in the neighboring duct assemblies are opposite to eachanother. The magnetic field generated in this manner has an orientationnormal to an elongated cathode surface and strength conductive to plasmaguidance produced by passing current through the duct assemblies. Inthis filtered arc deposition mode, the metal vapor plasma emitted fromthe cathode 486 passes through the ducts between the duct assembliesthereby allowing undesirable macroparticles and neutral metal vaporconstituencies to be eliminated and to deliver 100% ionized metal vaporplasma to the substrates.

In the remote anode arc plasma discharge (RAAD) mode, the current doesnot conduct through the duct assemblies 488, 490, 492, 494 and the metalvapor plasma extracting magnetic field is not generating. In thisduct-passive mode, the electrons emitted from the surface of the cathode486 can pass freely through the ducts 500, 502, 504, 506 which conductthe RAAD current between the cathode 486 in the cathode chamber 484 andthe remote anodes 530, 532 and 534 which surround the magnetron sources538 and 540 which are positioned along the chamber wall 506 of thecoating system 380. At the same time, the duct assemblies 488, 490, 492,494 serve as a barrier which stops the heavy particles such as metalvapor atoms, ions and macroparticles, emitted from the cathode 486 toreach substrates. The RAAD plasma ionizes and activates the plasmaprocessing environment in a processing area of the system 380 where thesubstrates are positioned. This results in the ability to conduct ionplasma cleaning, ion implantation ionitriding and remote arc assistedmagnetron sputtering (RAAMS) yielding advanced properties of plasmaprocessing products.

With reference to FIGS. 15A and 15B, a schematic illustration of avariation of the RAAMS system is provided. FIG. 15A is a schematic sideview of the RAAMS system while FIG. 15B is a schematic side viewperpendicular to the view of FIG. 15A. System 530 includes chamber 532,substrate holder 534 with substrates 536 to be coated, primary cathodes538A, b, magnetrons 540A, B and remote anodes 542A, B. Cathodes 538A, Bare located at side 544 (i.e., the bottom) of the chamber 532 in acathode section 548 separated from the coating section 550 of thechamber 532 by chevron shield 552, which is impermeable for heavyparticle but allows the electrons to go through toward the remote anodes542A, B in coating section 550. Shield 552 can be electrically floatingor it can be connected to the positive terminal of either primary arcpower supply 554 or an additional power supply (not shown). The primaryarc anode 556 is located at the middle of the cathode chamber 548between two arc cathodes: the cathode 538A in a left compartment of thecathode chamber 548 and the cathode 538B in a right compartment of thecathode chamber 548. The substrate holder 534 with substrates 536 to becoated is located between magnetrons 540A, B. The substrates facemagnetron 540A on left side and magnetron 540B on right side. The remoteanodes 542A, B are located above magnetrons 540A, B and are separatedfrom one another by an optional separation baffle 560. Separating anode556, substrate holder 534 with substrates 536 to be coated and optionalseparation baffle 560 effectively divide chamber 532 into two sides(i.e., a left side and right side) thereby preventing hot jet 562Aassociated with cathode 538A located on left side of chamber 532 fromflowing through the right side of chamber 532 toward remote anode 542Bfrom flowing into the left side of the chamber 532 toward remote anode542A. Remote anode 542A is coupled with arc cathode 538A on left side ofsubstrate holder 534 and remote anode 542B is coupled with the cathode538B on right side of the substrate holder 534. Anode 556, substrateholder 534 and optional separating baffle 560 effectively divide coatingchamber 550 into two sections: a left section housing left cathode 538A,left magnetron 540A and left remote anode 542A and a right sectionhousing the right cathode 538B, right magnetron 540B and right remoteanode 542B. This division forms two narrow discharge gaps or dischargecorridors: a left gap separating left magnetron 540A and substrateholder 534 on the left side of the coating section 550 and a right gapseparating the right magnetron 540B and substrate holder 534 on rightside of the coating section 550. The width of the separating dischargegaps ranges from 2 to 20 inches.

In a refinement, the cathode target can be made of a metal having agettering capability such as titanium alloy or zirconium alloy. In thiscase the shielded cathode electron emitting source also serves as avacuum gettering pump which improves pumping efficiency of coatingsystem 530. To further improve the gettering pumping efficiency, shield552 facing the evaporating surface of the cathode target 538A in thecathode chamber 550 can be water cooled and optionally connected to highvoltage bias power supply. When water cooled shield 552 is biased tohigh negative potential ranging from −50V to −1000V relative to cathodetargets 538A and 538B, shield 552 is subjected to intense ionbombardment by metal ions generating by the cathodic arc evaporatingprocess. Condensation of metal vapor under conditions of intense ionbombardment is favorable for pumping noble gases such as He, Ar, Ne, Xe,Kr as well as hydrogen. Moreover, water cooled primary anode 556 facingcathode targets 538A, B also contributes to the pumping capacity byincreasing the metal vapor condensation/gettering area.

Still referring to FIGS. 15A and 15B, it can be seen that severalmagnetron sources 540 are located above cathode chamber 548 in coatingsection 550. Substrate holder 534 with substrates 536 moves alongchamber 532 passing the magnetrons. Cathodic arc spot 564 moves alongcathode target 566 of arc cathode 538 while being steered by magneticsteering coil 570 or other steering means. Experimental investigation ofthis system revealed that narrow plasma jet 562 has a high plasmadensity ranging from 10¹¹ to 10¹³ cm⁻³ and an electron temperatureexceeding 2 eV (typically ranging from 3 to 20 eV). The majority of theremote anode arc discharge current flows along the narrow hot plasma jet562 and has an arc current density ranging from 0.1 mA/cm² to 100 A/cm².The rest of the coating section is filled by the cold and rare plasmawith electron temperature typically below 3 eV and plasma densityranging from 10⁸ to 10¹¹ cm⁻³. The width of hot plasma jet 562 istypically from 1 to 5 cm while moving with the same speed as cathodicarc spot 564 which follows the steering movement of the cathodic arcspot 564 on cathode target 566. It is believed that the most of theremote arc current conducts between cathode 538 in cathode chamber 548and remote anode 542 throughout hot plasma jet 562. It can be also seenfrom FIG. 15A that two hot plasma jets 562A and 562B form within thenarrow discharge gaps between left magnetron 540A and substrate holder534 on left side of the coating section 550 and between right magnetron540B and substrate holder 534 on the right side of the coating section550. Left jet 562A bridges left cathode 538A in a left compartment ofthe cathode chamber 548 and left remote anode 542A on the left side ofthe coating section 550. Right jet 562B bridges right cathode 538B in aright compartment of the cathode chamber 548 with right remote anode542B on right side of the coating section 550.

With reference to FIG. 16, a schematic illustration of a variation ofFIGS. 15A and 15B with a cathode in one of the compartments of thecathode chamber and with two cathodic arc spots is provided. In thisvariation, two plasma jets 562A and 562B formed between chevron baffle552 and remote anode 542 above each of cathodic arc spots 576A and 576Bbridge the current connections between cathode 538 and remote anode 542.The direction of the remote arc current along jets 562A and 562Bassociated with cathodic arc spots 576A and 576B are shown by thevertical arrows on these jets. The plasma distribution has maximums 578Aand 578B near each of the cathodic arc spots 576A and 576B moving alongthe erosion corridor 580 on cathode target 566 either by a steeringmagnetic field created by a steering coil located beyond the target 582(not shown) or by other means as described below. In this variation, thedimensions of the high ionization area is Ai˜L (magnetron)×W (jet). Inhorizontally aligned systems set forth above, the ionization area isonly Ai˜W (magnetron)×W (jet). The increase of the magnetron sputteringflow ionization area by vertical alignment of arc jet 562 (parallel tothe long side of the magnetron 540) vs. horizontal alignment of the arcjet 562 (parallel to the short side of the magnetron 540 as in theparent case) is approximately L (magnetron)/W (magnetron).

Still referring to FIG. 16, a confined plasma streams (i.e., a plasmajet) bridging the discharge gap between remote anode 542 and cathodetarget 566 through coating region 550, moves along direction d₄ whileremaining parallel to the long side of the magnetrons 540. The ends ofconfined plasma jets 562 move along direction d₄ as set forth in FIG.16. Arc spot 576 forms on cathode 580 along the erosion zone 578. Theplasma field 584 at remote anode 542 and the plasma field 578 at cathodetarget 580 are confined dimensionally in a space from about 1 to 5inches along direction d₄. In one refinement, magnetic steering fieldsare used to accomplish the rastering movement along d₄. In otherrefinements, this rastering movement is accomplished by mechanicallymoving cathode 580 along direction d₄. In still other refinements, athermionic filament cathode with secondary emission electrons movesalong d₄.

With reference to FIGS. 15A, 15B, and 16, an aspect of the relativesizing of various components of coating system 530 is provided. Remoteanode 542 has a linear remote anode dimension Da parallel to the cathodetarget 538. The horizontal area of location of vapor sources 538 (i.e.,the four magnetrons shown in FIG. 15B) is also relevant. The area alongthe direction parallel to the short side of the magnetrons 538 has alinear vapor source dimension D. Cathode target 566 has a linear cathodetarget dimension Dc parallel to the remote anode 542 and also parallelto the short side of the magnetrons 538. In a refinement, the linearremote anode dimension Da, the linear vapor source dimension D, and thelinear cathode target dimension Dc are parallel to each other. Inanother refinement, the linear remote anode dimension Da is greater thanor equal to the linear cathode target dimension Dc which is greater thanor equal to the linear vapor source dimension D.

FIG. 17 provides an alternative configuration of the remote plasmasystem utilizing a coaxial batch coating chamber layout with planarmagnetron sources 540 a, b located at the chamber walls and substratesto be coated 536 attached to the rotating carousel substrate holder 592.Coating chamber 590 includes carousel substrate holder 592 withsubstrates 536 to be coated and a set of the planar magnetron sputteringsources 540 a, b attached to the walls of the coating chamber 590 facingthe substrates to be coated. Coating chamber 590 also includes cathodechamber 600 with primary cathode 538 and coaxial primary anode 556located at the bottom of the chamber 590 and remote anode-ring 596located at the top of the chamber 590.

Cathode chamber 600 includes shield-housing 598 with openings 598 a, 598b facing toward the gap between the magnetrons 540 and the substrateholder 592. Optional separation baffle 560 in the form of a cylinder isalso installed in the rotating substrate holder 592. Anode 556,substrate holder 592, and optional separation baffle 560 create a narrowcoaxial gap within the chamber 590 between the magnetrons 540 and thesubstrate holder 592 to confine hot jets 562 and secure their positionparallel to the axes of the chamber 590. Openings 598 may be locatedcoaxial to the substrate holder 592. Cathode 540 has the shape of a ringcoaxial with coating chamber 590 and with primary cylindrical anode 556.Alternatively, several primary cathodes 540 are installed coaxially tothe primary anode 556 in a cathode chamber 548. The primary anode canalso serve as a condensation surface to improve the pumping speed bygettering effect effectively absorbing the residual gases within a filmforming on a surface of the anode 556 by condensation of the vaporplasma generated by the cathode 538. This configuration increases theremote arc plasma density thereby providing a more intense ionbombardment assistance rate during magnetron sputtering. In thisconfiguration, a denser zone of the remote arc discharge plasma iscreated in the gap between the magnetron target and substrates to becoated.

With reference to FIGS. 18A and 18B, a refinement with separate primarycathode chambers 548 for each magnetron sputtering source 540 isprovided. In the FIG. 18A, cathode chamber 548 is positioned undercoating chamber 550. Magnetron 540 is positioned in coating chamber 550immediately above the shield 552 separating cathode chamber 548 from thecoating chamber 550. Cathodic arc source 538 as a powerful electronemitter is positioned below the magnetron 540. The size of the cathodetarget, which defines the dimension of arc spot steering zone, isranging from ¼ to 2 times of the width of the magnetron target, butpreferably within the range from 0.5 to 1.5 times the width of themagnetron target. Primary anode 556 is positioned above the cathodetarget 566 and has a dimension generally smaller or equal to cathodicarc target 566. Magnetic steering coil 570 is optionally positionedunder the cathode 538 for steering arc spots at the surface of cathodicarc target 566. Remote anode 542 is positioned in a coating chamber 550above the magnetron 540 providing that cathode 538; magnetron 540 andanode 542 are aligned generally along the same line. High density plasmajet 562 forms within coating chamber 550 between shield 552 and anode542 along the surface of the magnetron 540 above the cathodic arc spot602 which is moving over the surface of the cathode target 566 by themagnetic steering effect provided by the steering magnetic field ofsteering coil 570. Cathodic arc spots 602 and plasma jet 562 are alignedalong a single vertical line parallel to the long side of the magnetron540 bridging the discharge gap toward remote anode 542. In thisarrangement, the steering of the cathodic arc spots 602 at the surfaceof the cathode target 566 provides a corresponding steering of the highdensity plasma jet 562 with remote anode arc current directed along thedirection parallel to the long side of the magnetron 540, while the axesof the jet 562 is parallel to the long side of the magnetron 540. Plasmajet 562 crosses the magnetron discharge in front of the magnetron targetbridging the distance between the shield and the remote anode 542 andionizes the sputtering metal atoms flow and gaseous environment in frontof the magnetron sputtering source 540 within the area where the plasmajet 562 crosses the magnetron discharge. The increase of ionization andactivation of the metal sputtering atoms and gaseous species in front ofmagnetron 540 is distributed evenly both along the direction parallel tothe long side of the magnetron 540 and along the direction parallel tothe short side of the magnetron 540. The uniformity of the ionizationability of the plasma jet 562 along the direction parallel to the longside of the magnetron 540 is achieved by the uniform distribution of theplasma density and the electron temperature along the plasma jet 562.The uniformity of the ionization ability of plasma jet 562 along thedirection parallel to the short side of the magnetron 540 is achieved byrepeatedly moving the jet 562 back and forth across the magnetrondischarge from one end of magnetron 540 to another by magneticallysteering displacement of the cathodic arc spot 602 on cathodic arctarget 566.

In a typical example, the primary arc discharge between the cathode 538in the cathode chamber 548 and the primary anode 556 is powered by thepower supply 554 a. The remote anode arc discharge between cathode 538and remote anode 542 is powered by power supply 608. Ballast resistor610 is installed between remote anode 542 and grounded coating chamber550, which allows control of the voltage drop between remote anode 542and grounded chamber 550. When the micro-arcing occurs at the coatingchamber 550 walls, electronic switch 612 will be closed thereby shortcircuiting remote anode 542 to the ground and effectively eliminatingarcing, followed by re-ignition of the remote arc when the position ofelectronic switch 612 is open. Switch 612 may be also open during thetime of igniting of the RAAD plasma. Ignition of the RAAD can beprovided by applying high voltage negative potential either to magnetron540 which starts the magnetron discharge or, alternatively, by applyinghigh negative voltage to the substrate holder 534 establishing the glowdischarge across the discharge gap between cathode chamber 548 andremote anode 542. The high voltage discharge as a means for ignition ofthe RAAD can be used in either DC or pulse discharge mode. Thedimensions of the magnetron sputtering target of the magnetron 540 aretypically 10 cm width×100 cm tall. The dimension of the cathodic arctarget 566 is typically about 10 cm, nearly equal to the width of themagnetron 540 target. The width of the plasma jet 562 is about 3 cm. Themagnetically steered moving velocity of the arc spot 602 over thesurface of the cathode target 566 is approximately 1000 cm/s. In thiscase, the repetition frequency of the plasma jet steering across themagnetron discharge zone will be approximately 50 Hz. Assuming theimproved ionization rate within the area of the magnetron dischargecrossed by the plasma jet 56 a is ˜30% the average ionization rate ofthe magnetron discharge plasma by the plasma jet 562 will reach ˜10%,which is at least an order of magnitude higher than that of theconventional magnetron sputtering flow. The improved ionization rate ofthe magnetron sputtering flow results in increased intensity of ionbombardment assistance during magnetron sputtering coating depositionprocess which yields coatings having nearly theoretical high density,low defects, high smoothness, and superior functional properties. Theinline vacuum coating and plasma treatment system utilizing a pluralityof magnetron sources, each provided with a separate cathode chamber, isshown in FIG. 18B.

With reference to FIG. 19A, a further advanced variation of the systemsof FIG. 14-18 is provided. Intermediate electrode-grid 622 is installedin front of the magnetron 540, which effectively limits the area of theconfinement of the high density plasma jet 562 in front of the magnetronsputtering target 540. In this arrangement, cathode chamber 548 isenclosed within the enclosure 628. Although enclosure 628 can beelectrically grounded, it is preferable that it is insulated from thegrounded chamber providing that there is no direct electrical couplingbetween the primary and the remote arc discharges. Enclosure 628 hasopening 630 facing the discharge gap or plasma corridor 632 between themagnetron target 634 and the electrode-grid 622. The length of opening630 is generally equal to that of the width of the magnetron target 634while the width of the opening 630 is less than the width d of thedischarge gap 632. Electrode-grid 622 can be composed of thin wires 638made of refractory metals chosen from the group of W, Ta, Nab, He, Ti,Mo, and stainless steel. The diameters of the wires are typically from0.01 mm to 2 mm. A diameter less than 0.01 mm may result in melting ofthe wire in a contact with RAAD plasma. A diameter thicker than 2 mmwill absorb too much coating material from the sputtering flow. Wires638 can be arranged in a screen of different patterns or as an array ofsingle wires parallel to each another. Grid electrode 622 must betransparent to the sputtering metal flow with transparency better than50%. The distance between the neighboring wires 638 in a screen or gridelectrode 622 is typically from 0.5 mm to 10 mm. Distances betweenneighboring wires in grid electrode 622 less than 0.5 mm are impracticaland can affect the transparency of grid electrode 622. Distances betweenneighboring wires 638 in grid electrode 622 greater than 10 mm may nothave enough plasma confining properties to confine plasma jet 562 withinthe discharge gap or the plasma corridor 632. The distance d between themagnetron target 634 and the grid electrode 622 is typically from 10 mmto 100 mm. Distances less than 10 mm are too small to confine the arcjet 562A, while distances greater than 10 cm are too large to provide anarrow corridor which can squeeze the plasma jet, effectively increasingits electron density, electron temperature, and the metal sputteringflow ionization rate.

Grid electrode 622 generally functions as an intermediate anode.However, it may also serve as a remote discharge plasma ignitingelectrode. In this latter case, switch 642 connects the negative pole ofhigh voltage DC or pulse power supply 644 to grid-electrode 622. When anegative high voltage DC or pulse bias potential is applied to the gridelectrode 622, it ignites the glow discharge providing the initialionization within the remote anode arc plasma discharge gap 632 therebyinitiating the RAAD plasma. After the RAAD plasma is ignited, switch 642can connect the positive pole of the intermediate anode power supply 646to the electrode-grid 622 transferring the electrode grid 622 in theintermediate anode mode when the electrode-grid 622 becomes anintermediate anode of the remote anode arc discharge. In this case, gridelectrode 622 is connected to the positive pole of the power supply 646,while the negative pole is connected to the cathode 538. In arefinement, the electrode-grid can be connected to the negative pole ofthe power supply 644 during operation of the RAAD plasma, while thepositive pole is connected to the cathode 538. In this case, thepotential of the electrode grid 622 will be negative in relation to thecathode 538, but the potential of the electrode grid 622 cannot be lowerthan the cathode 538 more than two times of the voltage drop between thecathode 538 and the primary anode 556. Electrode grid 622 can be alsoisolated from the other components of the coating chamber setup. In suchcases, the potential of the electrode-grid 622 will be set at floatingpotential value determined by the plasma density and electrontemperature in the RAAD plasma. The plasma density within the dischargegap 632 can be increased to the extremely high level by reducing thewidth of the discharge gap and increasing the remote anode arc current.This allows using sputtering target 540 a in the diode sputteringprocess without magnetic enhancement as required in the magnetronsputtering process.

The remote arc current density in jet 562 the remote arc discharge gapdefined between the anode grid 622 and the magnetron 540 is ranges from0.1 to 500 A/cm². A remote current density less than 0.1 A/cm2 are notenough to provide a desirable level of ionization of the magnetronsputtering flow. The remote arc current densities more than 500 A/cm2requires too much power of the remote arc discharge power supply whichis not practical for the applications. High current density of theremote arc discharge (i.e., jet (562) within the discharge gap definedbetween the anode grid 622 and magnetron 540 can be achieved by using aDC power supplies 646 and/or 608 which can provide a DC currents rangingfrom 10 to 2000 A to remote anode 542 and/or the grid anode 622 or,alternatively, by using a pulse power supplies which can apply apositive voltage pulses to the remote anode 542 and/or grid anode 622.The positive voltage pulses can range from 500 to 10,000 V and theassociated current pulses can range from 1000 to 50,000 A.

With reference to FIG. 19B, a variation of the system of FIG. 19A isprovided. Wires 638 in the grid-electrode array 622 are positionedparallel to each other and to the short side of the magnetron 540. Eachwire 638 is connected to the remote anode 542 via capacitor 640 andshunt resistor 642 while the diodes secure the direction of the currenttoward wire element 638. During operation, before the remote dischargeis ignited, capacitors 640 are charged to the maximum open circuitvoltage of the remote anode arc power supply 608. This arrangementtriggers the cascade ignition of the remote arc discharge by ignitingthe remote arc, first between the cathode 538 and first single wire 638positioned closest to the cathode 538, followed by propagation of theremote arc discharge sequentially via all intermediate single wireelectrodes 638 of the electrode grid array 622 toward remote anode 542.After the ignition phase, capacitors 640 will be discharged and thepotential of each wire 638 and of the entire electrode grid array 622will be determined by shunt resistors 642. If the remote anode arcdischarge is extinguished, capacitors 640 will be charged again to themaximum open circuit voltage of the power supply 608 with the cascadeignition automatically repeated. Alternatively, the ignition isinitiated by the control system. This approach can be also applied tothe multi-magnetron system similar to that shown in FIGS. 16 and 18B. Inthis case the intermediate ignition electrodes of the cascade ignitionarrangement can be positioned between within the gaps between therespective magnetron sputtering sources.

With reference to FIG. 19C, an additional advanced of the coating systemof FIG. 19A is provided. Capacitively coupled RF electrodes 648, 650 arepositioned at both cathode end 652 and remote anode end 654 of theremote arc discharge column 562. The RF generator and the matchingnetwork are installed in series with RF electrodes 648 to activate theplasma jet 562 by superimposing the RF oscillations along plasma jet562. The frequency of the oscillations can range from 10 kHz to 500 MHz.In a refinement, the frequency of the generator ranges between 500 kHzand 100 MHz. The commonly used 13.56 MHz RF generator is suitable forthis purpose. When intense RF oscillations are created within the plasmajet 562 the plasma density, electron temperature and, subsequently, theionization rate of the magnetron sputtering and gaseous plasma increasethereby resulting in an increase in the remote anode arc dischargeionization efficiency and activation capabilities. This further improvesthe properties and performance of the coatings and plasma treatedsurfaces by RAAMS discharge plasma. In another variation as illustratedin FIG. 19C, a pulsed high voltage generator or pulsed RF generator 656is used instead of a continuous-wave RF generator thereby providing highvoltage unipolar or RF pulses for ignition of RAAMS discharge as well assuperimposed high voltage high current pulses during the coatingdeposition process. The repetition frequency of the high voltage highcurrent or RF pulses range from 1 Hz to 100 kHz.

FIG. 19D provides a perspective view of the RAAMS module with anelectrode grid. Cathode chamber 548 with the primary cathode (not shown)and the primary anode (not shown) is positioned under the magnetronsputtering magnetrons 540. The electrode grid 622 is positioned in frontof the magnetron 540. The remote arc discharge, i.e., jet 562, isignited between the primary cathode (not shown) in a cathode chamber 548and remote anode 542. The remote arc jet 562 enters from an opening inthe cathode chamber 548 into the remote arc discharge gap createdbetween the grid electrode 622 and the sputtering surface of magnetron540.

With reference to FIG. 19E, a schematic of a system of another remoteanode coating system is provided. Remote anode arc plasma cage 622 canbe created in front of the magnetron target 634 of the magnetron vaporsource 540 as shown illustratively in FIG. 19E. The remote arc dischargecan be established between the primary arc cathode (not shown) in acathode chamber 548 and the anode cage (i.e., grid 622) and/or the topremote anode 542. In this embodiment of the invention the remote anodearc plasma is streaming from the opening 630 in the cathode chamber 548along the long side of the magnetron target 634 toward the grid anode622 and/or the top remote anode 542. Although the cage-grid remote anode622 can be made of wires aligned in many different patterns theembodiment of the invention shown in FIG. 19E utilizes the remote anodecage 622 composed of array of straight wires parallel to the long sideof the magnetron target 634.

With reference to FIG. 19F, which is a transversal cross-section of thesystem shown in FIG. 19E, a schematic of a system using an array ofwires is provided. This array of the parallel wires consists of theouter array of wires 622 a forming an outer boundary of the remote anodegrid-cage 622. The remote anode arc plasma jet is confined within theanode cage formed by this outer array of anode cage wire 622 a. It canalso optionally consist of the array of the inner wires 622 b which arepositioned within the anode grid-cage 622. When the positive DC or pulsepotential is applied to the anode grid-cage in reference to the cathodein the cathode chamber 548, the anodic plasma sheath is forming aroundeach of the wire of the array of outer wires 622 a and the inner wires622 b. The ionization efficiency within the anodic plasma sheath isgreater than that of the background plasma which results in theimprovement of the ionization rate of the magnetron sputtering flowhence contributing to further improvement of the coating properties. Therole of the inner wires 622 b is also to divert the charged particlessuch as electrons and positive ions curling their trajectories, creatinga pendulum effect, increasing the length of the trajectories of chargedparticles, and effectively trapping the charged particles within theanode grid-cage 622 hence increasing the ionization probabilities of themagnetron sputtering flow. This approach to plasma confinement can bealso used along without a need of magnetic confinement. This allowsusing the sputtering target in a diode sputtering mode without magnetswhile the high density remote anode arc plasma is confinedelectrostatically within the anode grid-cage 622. The characteristicdistance between the neighboring wires in the anode grid-cage 622 shownin FIG. 19E ranges from 0.5 mm to 30 mm. The thickness of each wire istypically ranges from 50 micrometers to 3000 micrometers. The remoteanode arc current density streaming along the target 634 parallel to itslong side from the cathode chamber opening 634 ranges from 0.1 to 500A/cm². The remote anode arc current can be provided either by DC powersupplies or pulse power supplies. The cross-section of the magnetronsputtering source 540 surrounding by the anode grid cage 622 is shownillustratively in FIG. 19F. The magnetron discharge 647 is establishedabove the magnetron target 7A inflicting a magnetron sputtering metalatomic flow 649. The anode cage consists of the outer array 622 a andthe inner anodic wire array 622 b. When wire is energized by applyingthe positive potential vs. the cathode in a cathode chamber (not shown),the anodic plasma sheath with enhanced ionization rate is establishedaround each of the wires of the anode grid-cage 622. The trajectories ofcharged particles (electrons and positive ions) 651 are diverting whenthe particle is approaching the anodic plasma sheath surrounding thearray of the wires 622 a and 622 b. In a refinement the wires of theanode grid-cage 622 is made of refractory metals such as W or Ta andtheir temperature is maintained in a range of 500-2500° C., which allowseffectively re-evaporate the metal atoms of the magnetron sputteringflow which can stick to the surface of the wire. It is believed thathigh ionization rate within the anode grid-cage will make it possible tooperate the sputtering vapor source in a pressure range below 0.5 mtorrand even without noble gas such as argon or krypton which therebyeliminating detrimental inclusions of the noble gas atoms in a coatinglattice.

With reference to FIG. 20, a variation in which the electron emissioncathodic arc source with a non-consumable cathode is provided. Cathodeassembly 660 includes a water-cooled cathode with a cylindrical shape orrectangular cavity. Rectangular cavity 662 includes an internalevaporating and electron emission surface 664 and the primary anode 666generally consisting of a cylindrical or a rectangular insert 668attached to the anode plate 670. Anode insert 668 is extended within thecathode cavity 662. Anode 666 is made of refractory metals chosen fromthe group of W, Ta, Nb, Hf, Ti, Cr, Mo and stainless steel. Anode plate670 is isolated from the cathode by ceramic spacers 672. Primary anode666 is attached to the water-cooled plasma transfer vessel 676 via thespacers 678, having small cross section providing high thermalresistance between the plasma vessel 676 and the primary anode 666. Theplasma vessel 676 includes opening 680 with facing the cathode 538throughout the tubular anode insert 668 on side of the cathode 538 andthe opening 682 facing the discharge gap between the electrode-grid 622and the magnetron source 540 on the side of the coating chamber 550. Thelength of the opening 682 is generally equal to that of the width of themagnetron target 634 while the width of the opening 682 is less than thewidth d of the discharge gap 632. The spacers 678 can be made ofrefractory metal. In this case the plasma vessel 676 is electricallyconnected to the primary anode 666. Alternatively, the spacers 678 canbe made of non-conductive ceramic, making the plasma vessel 676electrically isolated from the primary anode 666. In any case thespacers 678 must have a small cross section providing a high thermalresistivity between the water-cooled plasma vessel 662 and the primaryanode 668. In operation the primary anode is heated by the arc currentreaching the temperature when the re-evaporation of the metaltransferred from the cathode occurs effectively recycling the cathodemetal evaporating from the internal cathode surface 669 in the cathodicarc discharge.

Cathode vessel 662 is typically formed from a metal with a relativelylow melting temperature and high saturating vapor pressure. Examples ofsuch metals include, but are not limited to, Cu, Al, bronze and otherlow temperature alloys. Alternatively, cathode vessel 662 can be made ofcopper, but its internal evaporating and electron emission surface 669should be covered by a thin layer of a metal with low boilingtemperature (e.g., Zn, Cd, Bi, Na, Mg, Rb). Low temperature evaporatingmetals are easily re-evaporated by the hot primary anode when itstemperature is from 600 to 1100 deg. C. The water-cooled internalsurface of the plasma vessel 676 may also function as a condensationsurface effectively preventing the flux of cathode atoms to flow intothe coating chamber section 550. It is should be appreciated that thevariations of FIGS. 18-20 can be also used without electrode-grid 622.In this case the opening in the cathode chamber 548 facing the coatingchamber 550 should be positioned close to the surface of the magnetrontarget 634, facing the area of the magnetron discharge where the densityof the sputtering atoms is higher.

FIGS. 21A and 21B provide alternative configurations of remote plasmasystems. With reference to FIG. 21A, coating system 670 includessubstrate holder 672 positioned between magnetron sputtering source 674and anode 676. Coating system 670 also includes cathode chamber 678which is of the design set forth above. This configuration increasesremote arc plasma density thereby providing a higher ion bombardmentassistance rate during magnetron sputtering. With reference to FIG. 21B,coating system 680 includes anode 682 which is composed of thin wires.Anode 682 is installed between magnetron target 684 and substrate holder686. Coating system 680 also includes cathode chamber 688 as set forthabove. In this latter configuration, a denser zone of the remote arcdischarge plasma is created in the gap between the magnetron target andsubstrates to be coated.

A coating assembly, including the remote anode arc discharge (RAAD)plasma or the arc discharge, can be confined magnetostatically in thevicinity of the magnetron cathode and in front of the magnetron targetusing a magnetic trap made by a magnetic confining field generated bymagnetic coils strategically positioned outside of the vacuum chamberand outside of the magnetron sputtering area instead of an electrostatictrap made by a grid-anode positioned in front of the magnetron target. Amagnetic trap can be created by a magnetic field half-cusp configurationwhere the converging side of the cusp is facing the substrate to becoated; the magnetic field is “pinched’ toward the substrate to becoated. This magnetic trap configuration, also known as magnetic mirror,effectively reflects the electrons back to the magnetron targetpreventing the diffusion losses of the arc discharge, the RAAD plasma,from the area adjacent to the magnetron target. Alternatively, the arcplasma can be trapped within a closed-loop magnetic field area along oneor two long sides of the magnetron target.

With reference to FIG. 22A, showing a cross section view of the plasmaassembly, the RAAD plasma is confined by the magnetic mirror-trap withinthe half-cusp created between the convexed magnetic field lines ofrectangular confining magnetic coils 578 and 579 and the magnetrontarget 634. In this design both planar magnetrons with rectangulartargets or rotating magnetrons with cylindrical targets can be used assputtering sources. Alternatively, a cathode target without magnets canbe also used as a sputtering source for diode sputtering.

The magnetron sputtering source 540 is enclosed in a housing 545 and apair of confining magnetic coils 578 and 579 are positioned at oppositesides of the magnetron 540. The RAAMS module is equipped with a flange546 for attachment to the coating chamber. Each of the rectangularconfining magnetic coils 578 and 579 have a pair of linear conductorsparallel to the long side of the magnetron target 634, the front linearconductors 578 a and 579 a adjacent the substrates to be coated in thecoating chamber and the rear linear conductors 578 b, 579 b away fromthe substrate. The front and the rear linear conductors are connectedvia closing conductors perpendicular to the short side of the magnetrontarget 634, thus creating a coil. The confining magnetic coils 578 and579 are setup in opposite polarity, e.g. the direction of the current inthe front linear conductor 578 a is opposite to the direction of thecurrent in the front linear conductor 579 a. The confining coils arepositioned so that the field lines emanating from their center cross thesurface of the magnetron target. In this magnetic coils configuration,the magnetic half-cusp is created between the convexed magnetic forcelines 589 and the magnetron target 634. The plane of the magnetic forcelines 589 is perpendicular to the plane of the magnetron target 634 asthey are converging toward substrates to be coated in the coatingchamber. The magnetic field due to a magnetron sputtering cathode 585blends with the magnetic field lines 589 which confine an arc discharge562 which are reflected at a point of convergence 571.

In reference to FIGS. 22B and 22C, a pair of coupled unbalancedmagnetron sources 545 are installed opposite to each another. In thiscase the magnetic systems of magnetrons 545 can be setup in amirror-like configuration shown in FIG. 22B when the magnetic fieldpoles in front of the magnetron targets are the same and either north orsouth pole. This polarity of the magnetic systems is also named as amatched polarity. Alternatively, the configuration of magnetic field oftwo opposite coupled unbalanced magnetron sources 545 can be unmatchedas shown in FIG. 22C. In both cases the polarity of magnetic fieldcreated by a pair of focusing plasma confining coils 578, 579 have to bethe same as the polarity of the magnetic field created by the magnetron545 magnets. The magnetron plasma is more dispersed in a mirror-likeconfiguration shown in FIG. 22B vs. more focused, dense plasma flow in aconfiguration shown in FIG. 22C.

The side view of the RAAMS module with magnetic confinement is shownschematically in FIG. 22D. This configuration of the RAAMS module issimilar to that shown in FIG. 19A except for the hoods positioned at thebottom and top of the RAAD plasma area along the magnetron target 634.The substrate holder 534 with substrates 536, face the plasma jet 562. ADC power supply 851 is used to power the cathode. The positive pole ofthe power supply 851 can be grounded or, alternatively, connected to theremote anode 8 a via switch 853. The cathode hood 18 b is installed atthe top of the cathode chamber shield 18 and attached to the groundedwall flush-in with magnetron target 634, while the anode hood 8 bsurrounds the remote anode 8A in front of the anode chamber 8. Thecathode hood 18 b and anode hood 8 b are crossing the short edge of themagnetron target 634 erosion area (racetrack) and having their openingspositioned beyond the short edge erosion area boundary within themagnetron target 634. Cathode chamber 1A and cathode chamber shield 18include a primary arc anode 5, primary arc cathode 4, steering magneticcoil 15 and cathodic arc spot 66. The primary arc in a cathode chamber 1a is powered by the primary arc power supply 10, while the plasma jet562 is powered by the remote arc power supply 11. Steering magnetic coil15 directs cathodic arc spot 66 at the cathode target front surface.Only one confining magnetic coil 578 with front linear conductor 578 aand rear linear conductor 578 b is shown in this view. The direction ofthe current along the magnetic coil 578 conductors is shown by thearrow. In operation the RAAD plasma jet 562 enters the cathode hood 18 bthrough the opening 18 a in the cathode chamber enclosure 18, crossingthe magnetron magnetic field in the area of the short side magnetrontarget erosion corridor, and penetrates further in the area of themagnetron erosion zone parallel to the long sides of the magnetrontarget where it is confined within the magnetic half-cusp 571 (FIG. 22A)above the magnetron target 634. This confinement is due to the magneticmirror reflection effect by the converging convexed magnetic force lines571 which effectively reflects the electrons back to the magnetichalf-cusp creating plasma trap for RAAD plasma. The connection of thearc jet 562 to the remote anode 8 a in the anode chamber 8 is secured bythe anode hood 8 b. The direction of the magnetic force lines 589generated by confining coils 578 and 579 must coincide with thedirection of the magnetron magnetic force lines 585, shown in FIG. 22A,created by magnetron magnetic system positioned behind the magnetrontarget 634. The cathode hood 18 b and the anode hood 8 b allow theremote arc plasma jet 562 crossing the magnetic barriers created by themagnetron magnetic field near the erosion area of the short sides of themagnetron target 634 and penetrate into the area of magnetic cuspconfinement zone 571. The magnetic mirror configuration of RAAD plasmaconfinement can be combined with anodic grid shown in FIG. 19, combiningelectrostatic and magnetostatic confinement of the plasma, which canfurther improve the confinement capability of the plasma trap in frontof the magnetron target by imposing the arc plasma confining positivepotential along the magnetic force lines surrounding the magnetic cusparc plasma trapping area 571 and specifically at the end of the“pinched” magnetic field lines which will increase the reflecting of theions back to the magnetron target 634 area effectively sealing themagnetic cusp plasma trap 571.

In a variation of the present embodiment, FIG. 22E shows a hybridmagnetostatic/electrostatic plasma trap for confinement of the RAADplasma with a cathode 540. The wire electrodes 638, which are formingthe anodic grid, should preferably have shape repeating the shape of themagnetic force 589 lines from coils 578 and 579 forming the border ofthe magnetic cusp 571 in front of the magnetron target 634. This anodictrap will effectively charge the border of the magnetic cusp with highpositive “anodic” potential which will improve the confinement of remotearc plasma within the magnetic cusp trap area 571 and increase theconcentration of plasma species at the substrate 536.

FIG. 22F shows a variation of the configuration shown in FIG. 22D wherethe cathode power supply is a RF power supply 849. FIG. 22G shows avariation of the configuration shown in FIG. 22D where the cathode powersupply is a DC pulse power supply 800.

In accordance with the present embodiment, FIG. 23 shows the perspectiveview of the RAAMS vertical module with magnetic-mirror confinement ofRAAD plasma using coils 578 and 579 to create magnetic cusp 571 in frontof the magnetron target 634 and cathode 540. The magnetron cathode has along edge 540 d and a short edge 540 c. The cathode hood 18 b and anodehood 8B are bridging the remote arc plasma jet throughout the magneticbarrier around the bottom and the top short sides of the magnetrontarget 634 and allow the RAAD plasma to be transferred into the magneticcusp 571 without diffusion losses.

This approach can be also applied to the multi-magnetron system similarto that shown in FIG. 18. In a refinement shown in FIG. 24A, the modularinline system 10 comprising a set of RAAMS modules with magnetic-mirrorconfinement of RAAD plasma previously shown in FIGS. 22-23, is provided.The RAAMS modules are setup in line opposite to each other while asubstrate holder 534 with substrates to be coated 536 is positionedbetween two rows of the RAAMS modules with ability of reciprocatingand/or linear movement. To achieve the magnetic cusp configuration ofthe magnetic field in each of the RAAMS modules the polarity of theplasma confinement coils must be opposite in each pair of the coils onboth sides of the magnetron sputtering source. The polarity of theconfinement coils must be in agreement with the polarity of thepermanent magnets of the magnetron sputtering source providing that thedirection of the plasma confining magnetic field created by the magneticconfinement coil is same as a direction of the magnetron magnetic fieldat the same side of the magnetron target when the coil is positioned.For instance, the direction of the current in the front linear conductor578 a of the coil 578 is opposite to the direction of the current in thefront current conductor 579 a on the opposite side of the magnetron 540.In addition, the polarity of neighboring magnetron sources must be alsoopposite to each another. In this alignment the RAAD plasma jet 562 willbe confined within magnetic cusp area 571 adjacent to the magnetrontarget providing improved ionization and activation rate of themagnetron metal sputtering flow as well as chamber gaseous plasma. Thiswill result in high deposition rate and densification of the coatingsdeposited on substrates to be coated 536 on substrate holding cart 534.The exit magnetic-cusp field of the opposite modules in the inlinesystem 10 can have the same polarity (as shown in FIG. 24B) or oppositepolarity to their counterparts on the opposite side of the inlinesystem. When the opposite modules facing each another have the samepolarity of the exit magnetic cusps the RAAMS plasma will get moredispersed spreading over larger areas of the coating zone within thechamber 10. In this case the RAAMS plasma is distributed more uniformalong the path of the substrate holding cart 534 with substrates to becoated 536. In this case the energy conveyed from plasma towardsubstrates to be coated is also reduced by dispersing the flux ofenergetic particles over larger area. Alternatively, the polarity of theopposite RAAMS modules exit magnetic cusps can be opposite. In this casethe RAAMS plasma generated by the opposite modules in the inline system10 is focused in the area between the opposite modules facing eachanother. In this case the RAAMS plasma distribution along the inlinechamber 10 is less uniform with maximum plasma density along the axes ofeach pair of the opposite magnetron sources 540 facing each another. Inthis case the flux of the energetic particles reaching the substrates tobe coated 536 is greater along the axes of the opposite magnetronsources resulting in greater deposition rate and deposition temperatureof the substrates to be coated in the area near the axes of themagnetron targets.

The map of magnetic force lines in the inline configuration, calculatedby using the finite element modeling method is shown in FIGS. 24C, D,and E. In this system layout, the magnetron magnetic field has beenmodeled using a pair of current conductors 541 positioned behind themagnetron target 634. The polarity of the magnetic field is mirrored atthe opposite side of the inline system, e.g. the opposite modules facingeach another have the opposite polarity of the exit magnetic cuspsforming a magnetically matched magnetic field configuration. In FIG. 24Cthe current density in the front linear conductors 578 a and closinglinear conductors 578 b of the magnetic confinement coils 578 is 1.2×10⁶A/m², the current density in the linear conductors 541 a and 541 b,simulating permanent magnet-based magnetic system of the magnetron 540,is 2×10⁶ A/m². The directions of the currents in linear conductors areshown by the cross and dot marks with the dot for example, 541 a,indicating current flow out of the paper and the cross for example, 541b, indicating current flow into the paper. In this configuration themagnetron discharge is created in the area 585 adjacent to the magnetrontarget 634. The magnetic cusp 571 is forming in front of the magnetrontarget 634 between the front linear conductors of the magneticconfinement coils 578 and the magnetron target 634. It can be seen thatstrong magnetic beams 573 are forming along the plane of symmetry of theopposite magnetron sources 540. The magnetic beams 573 a and 573 bassociated with the neighboring magnetrons are directed opposite to eachother. When the currents in the confining magnetic coils are increasingthe magnetic cusp 571 becomes more definitive featuring sharpernarrowing toward opposite side of the system as illustrated in FIG. 24Din which the magnetic map of the same configuration as in FIG. 24C isshown, but with current densities of 2×10⁷ in the confining coils linearconductors 578 and 579; and 2×10⁶ in the simulating magnetron magneticfield linear conductors 541. In this case the magnetic cusps 571 areconverging toward opposite side of the system. In comparison themagnetic map of inline system with opposite magnetrons 540 havingunmatched magnetic polarity, but without currents in the confining coilsis shown in FIG. 24E. In this example, the currents in the linearconductors 541 simulating magnetron magnetic system are 5×10⁶ A/m². Itcan be seen that in this case the magnetic cusps 571 are not forming infront of the magnetrons 540, instead the magnetic field lines arediverging from the magnetron target toward opposite side of the system.At the same time the magnetic beams 573 are still forming along theplane of symmetry between the opposite magnetron sources 540. Themagnetic beams 573 are transporting the ionized metal sputtering plasmafrom magnetron targets toward substrates to be coated positioned in thecoating area between the two opposite rows of the magnetron sources 540.

In a variation of this refinement, FIG. 24B schematically shows the planview of the hybrid inline system employing both magnetostatic andelectrostatic confinement of the RAAD plasma. The wire electrode 638 isrepeated for each magnetic cusp.

In a further refinement, FIG. 25A shows the RAAMS process with tworemote arc jets propagating along the long sides of the magnetrondischarge area is provided. In this case the remote arc discharge istransported from the cathode chamber 18 throughout the cathode hoods 18a and 18 b into one of two long side portions of the magnetron discharge667 a and 667 b. Cathode chamber 1 a and cathode chamber shield 18enclose a primary arc anode 5, primary arc cathode 4, steering magneticcoil 15 and cathodic arc spot 66. In this case two separate remote arcplasma jets 562 a and 562 b are formed along the long sides 667 a and667 b of the magnetron discharge 667. The penetration of the arc currentthroughout the magnetic barrier of the short side portion of themagnetron discharge 667 c into one of the long side portions of themagnetron discharge 667 a or 667 b is provided under the cathode hoods18 a and 18 b which have the height typically equal or less than thethickness of the magnetron discharge. The width of each cathode hood 18a and 18 b is less than or equal to the width of the magnetron racetrackerosion zone parallel to the long side of the magnetron target 634.Typically the height of the hood is ranging from 10 to 50 mm. Identicaldouble-hood is provided for transporting remote arc plasma throughoutthe magnetic barrier of the short side portion of the magnetrondischarge 667 d on side of the remote anodes 9 a and 9 b installed inthe separate anode hoods 8 a and 8 b. The primary arc in the cathodechamber 1 a is powered by the power supply 10, while each remote arc 562a and 562 b is powered by separate power supplies 11 a and 11 b. In thisembodiment of the invention the remote arc plasma is trapped by theclosed-loop magnetic field along the long sides of the magnetrondischarge.

In yet another refinement, FIG. 25B illustrates the cathode hood 18 cpenetrating the short portion 667 c of the magnetron discharge area 667on cathode side. It is opened to the cathode chamber 18 via opening 18 dand has anode compartment 18 e on the other side of the short portion667 c of the magnetron discharge area 667. The intermediate anode 9 c isinstalled within anode compartment 18 e of the cathode hood 18 c. Thecathode hood 18 c also has two openings 18 a and 18 b facing oppositesides of the magnetron discharge area 667 a and 667 b at its shortportion 667 c on arc cathode side. The remote arc discharge 562 shown inFIG. 22a is propagating throughout the cathode hood along the magnetrondischarge areas 667 a, 667 b, and 667 c where the remote arc plasma isconfined by the magnetron's closed loop magnetic field 669. Cathodechamber 1 a and cathode chamber shield 18 include a primary arc anode 5,primary arc cathode 4, steering magnetic coil 15 and cathodic arc spot66. The primary arc in the cathode chamber 1 a is powered by the primaryarc power supply 10, while the remote arc conducting between the primarycathode 4 and the remote anode (not shown) is powered by the remote arcpower supply 11. In particular, the arc remote arc discharge propagatesfrom the cathode chamber 18 via opening 18 d in the cathode hood 18 ctoward intermediate anode 9 c which is powered by a separate powersupply, while at the same time it propagates though the openings 18 aand 18 b into magnetically confined magnetron discharge area 667 withinits short portion 667 c on cathode side and continue propagating alongboth long side portion of the magnetron discharge 667 a and 667 b towardremote anode on the other side of the magnetron target. The arrows showthe direction of remote arc current toward remote anode positioned onthe other side of the magnetron target (not shown). This willeffectively confine the remote plasma jets 562 a and 562 b withinmagnetically confined long portions of the magnetron discharge 667 a and667 b as illustrated in FIG. 25B.

In accordance with the present embodiment, FIG. 25C shows across-section of long portions of a cathode 540 with the magnetrondischarge 564 and erosion groove 542 with embedded remote arc discharge562. Note: the remote arc plasma magnetic confinement by closed loopmagnetron magnetic field 585 shown in FIG. 25C can be combined withmagnetic confinement by opposite confining coils and also with anodicgrid as illustrated in FIGS. 22E and 24B. In a refinement, the primaryarc discharge can be embedded within short portion of the magnetrondischarge. In this case the arc discharge can be hot filament thermionicdischarge or hollow cathode discharge with cathode fully immersed withinthe short portion of the magnetron discharge.

In a refinement, the confinement of the remote arc plasma in front ofthe magnetron target can be achieved without permanent magnets asillustrated in FIG. 25D. In this embodiment of the invention theelectromagnetic coil 539 is positioned behind the magnetron target 541.The arch-shaped confining magnetic field lines 585 are created in frontof the magnetron target as a portion of a close loop magnetic forcelines created around the linear current conductors 539 a and 539 b. Theracetrack erosion area 542 is developing under the magnetic field arches585 while the remote arc 562 is created between a cathode chamberpositioned at one end of the long magnetron target with the openingfacing one of the short sides of the racetrack and a remote anodeadjacent to the other short side of the racetrack at the opposite end ofthe magnetron target along its long side; the remote arc 562 is immersedwithin the racetrack plasma discharge area defined under the archedmagnetic force lines 585. FIG. 25E illustrates a variation with twoelectromagnetic coils 538 and 539 positioned behind the magnetron target54, extending away from the back side of the magnetron target 541. Inthis variation the linear current conductors 538 a and 539 a, haveopposite direction of current, and are positioned immediately behind themagnetron target 541 to create an arch-shaped plasma confining magneticfields 585 in front of the magnetron target 541. This magnetic fieldconfiguration is not creating a closed loop configuration used inconventional magnetron sputtering, but instead creates two distinct,parallel racetrack magnetic fields which are the portions of thecircular closed loop field around the current conductors 539 a and 538a. The closing linear conductors 538 b and 539 b are positioned awayfrom the magnetron target 541. In this configuration two independentremote arc discharges 562 a and 562 b can be established within tworacetracks areas under the arc magnetic force lines 585 a and 585 b infront of the magnetron sputtering target 541. Two parallel,not-connected erosion areas 542 a and 542 b, will be developedimmediately under the racetrack's, magnetically confined, dense plasma,generated by remote arc discharges 562 a and 562 b. It is also possibleto create a larger number of a parallel not connected racetrack areas585 with magnetically confined parallel independent remote arcs 562 andassociated parallel not connected erosion areas 542 by using a largernumber of electromagnetic coils 539 with front linear conductors 538 a,539 a and others positioned immediately behind of the magnetron target541 and having opposite direction of the currents in the neighboringlinear conductors 539 a and 538 a and additional linear conductorsparallel to each another facing the magnetron target 541. The closingconductors of electromagnetic coils 538, 539 and additional conductorsparallel to each another are positioned away from the magnetron target541. The magnetic flux density generated by the linear conductors 538 aand 539 a within the racetrack area immediately in front of themagnetron target 541 should be sufficient for confining the remote arcplasma columns within the discharge area in the racetrack and can rangefrom 5×10⁻³ Tesla to 2 Tesla. The highest magnetic flux density may berequired for such diverse applications of the present invention asreactors for controlled plasma fusion, plasma thrusters and metal vaporion lasers. To achieve the magnetic field density in the range of0.5-1.5 T the electromagnetic coils with cryogenically cooledsuperconductor wire can be utilized. When electromagnetic coils are usedto make the arch magnetic field configuration in the racetrack areas thesputtering of the sputtering target 541 can be achieved at much lowertarget voltage typically starting from 100 V in a sharp contrast to theconventional magnetron discharge which has a starting threshold around300 V. In the case of using electromagnetic coils instead of permanentmagnets the sputtering target can be energized by applying both DCpower, RF power and/or DC pulse power to the magnetron target. The DCvoltage can typically range from 100V to 2 kV while DC pulse voltage canrange from 100V to 10 kV with pulse current amplitude ranging from 1 Ato 100 kA. The low voltage sputtering mode can also be employed for ioncleaning of sputtering target 541 in reactive sputtering processes.Optionally, the sputtering target 541 can be movable in the directionparallel to the plane of the target as shown by the two-way arrow inFIG. 25E. Material utilization of the sputtering target 541 can besubstantially improved by scanning the target 541 back and forth whilekeeping steady positions of the erosion corridors 542, which are definedby the linear conductors 538 and 539 positioned behind the target 541.In the reference to the FIG. 25F, the global view of the magnetronsputtering source 540 of the present invention is presented whichutilizes 4 electromagnetic coils 536, 537, 538 and 539 to create fourindependent racetrack erosion areas at the sputtering of the target 541.The electromagnetic coils have front linear conductors 536 a, 537 a, 538a and 539 a adjacent to the target 541, which create four parallelcolumns of arch-shaped magnetic field in front of the sputtering target541 which are corresponding to four parallel independent racetracks infront of the sputtering target 541. The electromagnetic coils 536through 539 have alternating directions of the currents as shown by thearrows in the FIG. 25F. The electromagnetic coils also have closingconductors 536 b, 537 b, 538 b and 539 b distant from the target 541 andparallel to the front linear conductors. The cathode chambers 1 a, 1 b,1 c and 1 d with primary cathodic arc sources to generate fourindependent primary arcs are positioned adjacent to the bottom side ofthe target 541 while the remote arc anode, common to all four remotearcs, is positioned in the remote anode chamber 8 adjacent to the topside of the target 541. The remote arcs 562 a, 562 b, 562 c and 562 dare immersed within the corresponding racetracks in front of themagnetron target 541. The current directions of the remote arcs are inthe same direction from the cathode on a bottom of the figure and towardthe anode on a top of the figure. The remote arcs are entering into thecorresponding racetracks area via openings 18 a, 18 b, 18 c, and 18 d inthe cathode chambers 1 a, 1 b, 1 c and 1 d respectively. The remote arcplasma columns are confined to the target 541 by the arch-shapedmagnetic field created by the linear conductors 536 a, 537 a, 538 a and539 a. This advanced embodiment of the invention illustrates theopportunity of having a large number of parallel racetracks adjacent toa common sputtering target while using electromagnetic coils as theracetrack generating means. Alternatively, parallel arrays of permanentmagnets, with alternating polarities of the neighboring arrays, can bealso used to create a multiple racetrack magnetron discharge withimmersed remote arc plasma columns in front of the large rectangularmagnetron sputtering target 541. Referring to FIG. 25G, two parallelindependent racetracks are developed by two sets of permanent magnetyoke-shape arrays 539 and 538. Each of these arrays consists ofpermanent magnets 539 a, 539 b, 538 a, 538 b adjacent to the back sideof the magnetron target 541 which can be made of magnetic alloys such asSm—Co alloy. The closing magnetic shunts 539 c and 538 c can be made ofsoft magnetic alloy such as pure iron alloy. The magnetic tunnels withembedded remote arc discharges 562, parallel to the long side of thetarget 541, are created under the arch-shaped magnetic force lines 585between the north and south poles of respective magnetic yokes 538 and539 creating two independent magnetic tunnels above racetracks 542 a and542 b confining two independent remote arcs 562 a and 562 b which areprimarily responsible for generating the plasma in front of themagnetron sputtering target 541. As illustrated by the arrow in FIG.25G, the sputtering target is movable in a direction parallel to theplane of the target enabling an increase in target utilization rate. Therotating magnetron with permanent magnet array positioned adjacent tothe rotating target can be also used which can substantially increasethe utilization of sputtering target material. Referring to FIG. 25H,the yoke-shape permanent magnet array 539 similar to one shown in FIG.25G, is aligned behind a rotating sputtering target 541 with the longside of the magnet array 539 parallel to the axes of rotation of thetarget, shown by the arrows in FIG. 25H. The remote arc plasma jet 562is magnetically confined within the area of the target positionedbetween north and south poles of the magnetic array 539 and confiningmagnetic barrier defined by the arch-shaped magnetic field lines 585.Another variation of this embodiment of the invention is shown in FIG.25I in which a movable thin-sheet of sputtering target 541 is made byroll-to-roll arrangement between two rolls 541 a and 541 b. In arefinement the sputtering target can be made in a form of a disk withparallel remote arc discharges as shown illustratively in FIG. 25J. Inthis arrangement the magnetron sputtering target 541 is in the form of adisk and is positioned within the grounded shield 541 a. Severalparallel remote arc discharges 562 a, 562 b, 562 c and 562 d are createdbetween the cathode chambers 1 a, 1 b, 1 c and 1 d on one side of theshield 541 a, and the mutual remote anode 8 on the opposite side of theshield 541 a, and are magnetically confined and extended along theshield 541 a by the parallel magnetic arrays or electromagnetic coilspositioned behind the target 541. The remote arcs are penetrating withinthe racetrack area via openings 18 a, 18 b 18 c and 18 d in the cathodechambers 1 a, 1 b, 1 c and 1 d. The target 541 is energized by themagnetron power supply 12. When the target 541 is rotating in thedirection shown by the arrows in FIG. 25J, the race track erosion isuniform on the target resulting in the increased target utilizationrate. In a variation of the embodiment shown in FIG. 25C additionalelectromagnetic coil 581 can be added surrounding the cathode 540 asillustrated in FIG. 25K. The magnetic field lines 586 of the coil 581must have same directions as magnetic field lines 585 created by thepermanent magnets of the magnetron cathode 540. In this case themagnetic field created by the permanent magnets is blended with themagnetic field created by the coil 581 which will further improve themagnetic trap capability of the remote arc plasma assisted magnetron 540and plasma density in front of the magnetron target 541. The inlineconfiguration of the RAAMS with electromagnetic enhancement is shownschematically in FIG. 25L. In this figure also shown a magnetic mappingproduced by computer modeling using FEM based software. In this modelthe current in the linear conductors 581 a, 581 b, 582 a, 582 b andothers of the electromagnetic coils surrounding the magnetron cathodesare setup to 10,000 A. The permanent magnets 539 a, 539 b and 539 c ofthe magnetron magnetic yoke 539 made of hard magnetic materials such asSm—Co alloy are simulated by the magnetization vectors, while themagnetic shunt 539 d, typically made of soft iron, is simulated by thenon-linear BH curve. In the model shown in FIG. 25L the magnetization ofthe permanent magnets is setup to M=5×10⁵ A/m. The poles of themagnetrons 540 positioned in the opposite rows of the inline system 10as well as poles of the magnetron positioned next to each another in onerow, are opposite to each other. The substrate holding mechanism 534capable of moving substrates to be coated in the lateral direction ispositioned along the line parallel to the magnetron targets 541 in themiddle between two opposite rows of magnetrons 540. In a refinement theelectromagnetically enhanced RAAMS inline chamber with rotary magnetronsis shown in FIG. 25M. The rotary magnetrons 540 are positioned in vacuumchamber 10 forming two opposite rows facing the substrates installed atthe laterally movable substrate holding platform 534. The rotarymagnetrons consists of a rotatable cylindrical target 541 and themagnetic yoke 539. The electromagnetic coils 581, 582, 583 and othersare installed outside of the vacuum chamber within the gaps between theneighboring magnetrons 540. The currents in a linear conductorspositioned at opposite sides of the magnetron cathode have oppositedirections. For example, the currents in conductors 581 a, 582 a, 583 aand 584 a are opposite to the currents in the conductors 581 b, 582 b,583 b and 584 b. The polarities of the magnetron cathodes facing eachanother in the opposite rows as well as polarity of the neighboringcathodes in the same row are also opposite to each another. The remotearc discharge can be extended in the direction parallel to either shortside of the magnetron target 541 as shown, for example, in FIG. 1A or inthe direction parallel to the long side of the magnetron target 541 asshown, for example, in FIG. 18B.

In a variation, FIG. 26A shows a cross section side view of the primaryvacuum arc between two opposite rod-electrodes positioned across theshort portion of the magnetron discharge. Two coaxial rod electrodes,the primary cathode 701 and the primary anode 702, face each other andare immersed within the short portion of the magnetron discharge 564with the axes of the rod-electrodes perpendicular to magnetrondischarge. Both electrodes have water-cooling jackets. The rodelectrodes can be made from tungsten, molybdenum, graphite or otherrefractory metal or alloy. The primary arc, powered by the power supply10 can be ignited by using a magnetic spring-coil device consisting of asolenoid 704 and spring 705. Optionally it can also have a separateigniter which can trigger the vacuum arc discharge on the surface of thecathode 701. The separate igniter can be also positioned near theinter-electrode gap and powered by high voltage pulse power supply or RFpower supply. It is appreciated that either rod-cathode 701 or rod-anode702 or both rod electrodes can have channels to supply gas such as argoninto the enter-electrode gap to ease the ignition of the primary arcdischarge as shown illustratively in FIG. 26C. Referring to the FIG.26C, the primary arc cathode rod 701 has a channel 736 to supply theplasma-creating gas into the inter-electrode gap 738. Theplasma-creating gas, typically argon, is supplied via the cathode gassupply line 734. In this case RF pulse voltage can be supplied to thecathode 701 or the anode 702 using oscillator via separating capacitorto ignite the primary arc discharge. The inductance can be used in theprimary arc DC power circuit to protect the DC power supply from highvoltage RF pulses. The ignition pulses or RF voltage as well as gas flowin the primary cathode can be discontinued immediately after theignition of the primary arc which will continue operating in the vacuumarc mode. Optionally, the cathode hood 18 a is covering the primary arcrod electrodes, preventing cathode erosion to contaminate the magnetronsputtering metal flow as illustrated in FIG. 26D. The cathode hood 18 acan be partially surrounding or fully covering a short portion of themagnetron discharge forming a discharge tube for confining a portion ofthe remote arc discharge within a short branch of the magnetronracetrack parallel to the short side of the magnetron target 634. Theremote anode 9 in a form of a hood is partially surrounding or fullycovering a short portion of the magnetron discharge on opposite side ofthe long magnetron target 541, is connected to the positive pole of theremote arc power supply 11, while its negative pole is connected to theprimary cathode 701. Alternatively, the remote arc discharge can beestablished between the primary anode 702 and the remote anode 9. Inthis case the primary anode 702 is serving as intermediate cathode tothe remote arc discharge 562. The primary arc power supply 10 can bealternative current power supply to establish AC primary arc between theprimary arc rod-electrodes 701 and 702. In this case either of theelectrodes 701 or 702 can serve as a cathode for the remote arcdischarge 562. After ignition of the primary arc discharge between theprimary cathode 701 and primary anode 702 the remote arc discharge 562is immediately ignited between the primary cathode 701 and remoteanode-hood 9. Two branches of the remote arc discharge are created alongthe long portions of the magnetron discharge 564 connecting the cathode701 to remote anode 9. The direction of the remote anode arc is shown inFIG. 26A by the arrows. The remote arc 562 plasma is magneticallyconfined within the magnetron discharge by magnetron magnetic field 585which magnetically isolates the plasma and preventing its losses bydiffusion. The position of the primary arc electrodes within the shortportion of the magnetron discharge parallel to the short portion of themagnetron target 541 is shown in more details in FIG. 26B. Bothelectrodes have water-cooling jackets, schematically shown in 706 and703. The water cooling jacket 703 is shown on back side of the anoderod. The primary arc cathode-anode gap is positioned in the portion ofthe magnetron discharge 564 where the magnetic field lines of themagnetron magnetic field 585 are generally parallel to the axes of thecathode-anode coaxial electrode pair.

In accordance with the present embodiment, shown in FIG. 26B, thecathode 701 is typically frustoconical while the anode 702 may have aflat surface perpendicular to the anode axes. In this case of thefrustoconical cathode shapes, the cathodic arc will preferably belocated at the end of the cathode rod facing the anode. Theinterelectrode gap is typically ranging from 1 to 50 mm, generally notexceeding the racetrack width, while the diameter of the rod-electrodesis ranging from 5 to 30 mm. The distance from the cathode-anode axes tomagnetron target 541 is generally ranging from 5 mm to 40 mm, but ispreferably ranging from 10 mm to 25 mm.

Still referring to the present embodiment, FIG. 26D shows cathode 540with a primary vacuum cathodic arc including the primary rod cathode 701and the primary rod anode 702 positioned in the middle of one of shortportions of the magnetron racetrack 667. The cathode-anode rods aresetup coaxially across the magnetron racetrack 667. The primary arcdischarge gap 4 between the primary cathode 701 and the primary anode702 is positioned in the area where the magnetic force lines of themagnetron magnetic field are generally parallel to the cathode-anodeaxis. The spring coil 704 is used for moving the cathode to ignite theprimary arc discharge within the cathode-to-anode gap 738. The primaryarc is powered by the power supply 10. The remote anode 9 in a form of ahood is surrounding the short portion of the magnetron racetrack at theopposite side of the magnetron target. The remote anode is powered bythe power supply 11 connected between the primary cathode 701 and theremote anode 9. The remote arc discharge 562 is embedded within themagnetron discharge 667 and the remote arc current is conducted throughtwo parallel branches 562 a and 562 b of the remote arc dischargeembedded with the corresponding long side parallel branches of themagnetron discharge 667 a and 667 b. The plasma of the magnetrondischarge 667 with embedded remote arc discharge 562 is confined by theclose-loop magnetron magnetic field 585. The arrows show the directionof remote arc current toward remote anode positioned on the other sideof the magnetron target. The remote arc current density can be estimatedas the following:j _(RAAD) =I _(RAAD) /A _(M.D.) =I _(RAAD)/(W _(M.D.) *H _(M.D.))where I_(RAAD) and j_(RAAD) are remote anode arc discharge current andremote anode arc discharge current density respectively; W_(M.D.),H_(M.D.) is the magnetron discharge width, which is typically equal tothe width of the racetrack on magnetron target and is the thickness orheight of the magnetron discharge, which is typically equal or less thanthe width of the racetrack. The area of the magnetron confining zoneA_(M.D.)=W_(M.D.)*H_(M.D.). The RAAD current density to be confinedwithin the magnetron discharge which is necessary to secure highionization of the magnetron sputtering flow is typically ranging from 1to 500 A/cm². For example, if H_(M.D.)=5 cm, W_(M.D.)=5 cm, A_(M.D.)=25cm and the RAAD current of the RAAD discharge embedded within one of twolong-side branches of the magnetron discharge I_(RAAD)=250 A thenj_(RAAD)=10 A/cm². The confining coils and the anode cage surroundingthe magnetron discharge can be also used in addition to magneticconfinement by the magnetron magnetic field itself as was discussedbefore and illustrated in FIGS. 22E and 24B.

In a refinement the primary arc discharge can be generated by the arcjetthruster positioned adjacent to the short portion of the magnetrondischarge racetrack as illustrated in FIG. 26E, which is advancedvariation of the embodiment of the present invention shown in FIG. 26C.The cathode 540 has an arcjet thruster 722 as a primary arc sourceconsisting of the rod cathode 701 and anode-nozzle 703 which generatesan arc plasma plume 705 which crosses the short portion of the magnetronracetrack 667 c while the remote anode 8 has a hood 9 surrounding theshort portion of the magnetron discharge 667 d at the opposite side ofthe magnetron target. The primary arc within the arcjet thruster 722 ispowered by the primary power supply 10. Optionally, the cathode hood 18a is covering the arcjet thruster 722, preventing cathode erosion tocontaminate the magnetron sputtering metal flow. The cathode hood 18 acan be extended to surround the entire short portion of the magnetronracetrack 667 c at the side of the primary arc source jet thruster 722forming an arc plasma plume 705 in the shape of a discharge tube toguide the remote arc jet along the magnetron racetrack within themagnetron discharge plasma 667. The remote arc discharge 562 ispropagating along the long portions of the magnetron racetrack dischargeplasma 667 a and 667 b toward remote anode 9. The remote arc dischargecurrent directions are shown by the arrows in FIG. 26E. One of thereasons why the remote arc discharge plasma can be embedded within themagnetron discharge is that the electrical resistivity across magneticforce lines is much higher than along the axis of the magnetrondischarge, which makes it possible to magnetically confine the magnetronplasma along with embedded remote arc plasma near the magnetron targetsurface, preventing the remote arc current from escaping toward outsideof the magnetron racetrack area. In RAAMS process the magnetron magneticfield causes both the magnetron plasma and remote arc plasma to beconfined along the magnetron discharge racetrack. As a result, theplasma density within the discharge area in the racetrack increases,resulting in an increase of the magnetron sputtering rate and metalatoms ionization rate which contributes to the improvement inproductivity of the coating deposition process and in the properties ofthe deposited coatings.

Another variation of the invention is presented in FIG. 26F. The arcdischarge can be initiated within the magnetron discharge between twoelectrodes positioned adjacent to the short portion of the magnetrondischarge racetrack at opposite sides of the magnetron target. The tworod-electrodes 822 and 821 are immersed into the magnetron dischargewithin the short portions of the magnetron racetrack at the oppositesides of the magnetron target. The rod electrodes are covered by thehoods 18 a and 9 positioned at the bottom electrode holder 18 and topelectrode holder 8 respectively. The electrodes are connected to the DCpulse power supply 800 consisting of high voltage transformer 801,rectifier 803, and the energy-storage capacitor 805 and switch 807. Theunipolar high voltage pulses are generated between the electrodes 821and 822 when the trigger 807 is closed. The high voltage pulses withvoltage amplitude typically ranging from 300V to 50 kV and currenttypically ranging from 1 A to 10 kA, applied between the electrodes 821and 822 ignite the arc discharge embedded within the magnetron dischargeracetrack, which dramatically increases the magnetron discharge plasmadensity and electron temperature leading to increase of ionization ofmagnetron sputtering metal atom flow. Concurrently DC power, RF power orDC pulse power can be applied to the magnetron sputtering target. The DCvoltage can typically range from 300V to 2 kV while DC pulse voltage canrange from 300V to 10 kV with pulse current amplitude ranging from 1 Ato 100 kA.

In another refinement, FIG. 26G illustrates that the power supply 800can be RF power supply or RF pulse power supply, consisting of RFgenerator 802 connected to the electrodes 821 and 822 via coaxial cable810, consisting of the inner high voltage conductor 810 b and thegrounded shell 810 a. The water-cooled rod electrodes 821 and 822, heldby the dielectric flanges 823 and 824, are immersed into the shortportions 667 c and 667 d of the magnetron racetrack respectively. Thehigh voltage conductor 810 b is coupled to the RF generator via matchingcoil 804 and capacitor C. When a high voltage RF pulse is appliedbetween the electrodes 821 and 822 the high current discharge isgenerating along the long portions 667 a and 667 b of the magnetronracetrack. The pulse discharge consists of the pulse arc columns 562 aand 562 b embedded within the magnetron discharge. In this case themagnetron discharge racetrack is serving as a waveguide for conductingthe electromagnetic waves generating by the RF power supply. Themagnetron plasma immersion arc discharge increases the electron densityand electron temperature of the magnetron plasma resulting insubstantial increase of the ionization of magnetron sputtering atomflow. It should be appreciated that high ionization, high density andhigh temperature, which can be obtained in RAAMS plasma can be also usedfor applications other than deposition of coatings and surfacetreatment. For instance, highly ionized metal vapor flow generated byRAAMS discharge can be used for plasma propellant in space plasmathrusters. The reverse RAAMS discharge with positive, floating orgrounded potential applied to the magnetron target and high voltagepulses, either DC or RF, applied between the arc immersion electrodes821 and 822, can be used for controlled plasma fusion in mixed deuteriumand tritium plasma confined within the magnetron racetrack magnetictrap. The reversed RAAMS discharge can be also used for the inertialelectrostatic controlled fusion (IECF) when the reversed RAAMS plasmasource can create dense ion beam at lower pressures than conventionalglow discharge. In this case the high voltage positive pulses areapplied to the magnetron target while the background dense plasma isgenerated by the remote arc discharge. Optionally, the positive pulsescan be also applied to the positive string electrodes positioned infront of the magnetron source as shown, for example, in FIGS. 22E and24B. In this configuration, similar to one shown in FIG. 24B, the ionbeams, generated by opposite reversed RAAMS plasma sources, can collide,initiating the plasma fusion reactions within the ion beam collisionarea.

FIG. 27A shows the spectra of chrome ions generated in the RAAMSdischarge collected by optical emission spectrometry (OES) vs. remoteanode arc current with and without a set of opposite magnets having thesame configuration as the magnetron magnetic system which mimics theconfiguration shown in FIGS. 22B and 22C, but without current in theconfining coils. It can be seen that increase of the magnetic field inthe RAAD discharge confinement area results in substantial increase ofionization rate of the chrome sputtering atoms. The opposite magnetswith matched (mirrored) magnetic polarity create a magnetic beam alongthe plane of symmetry with the opposite magnetron as was demonstrated inFIG. 24E by the finite element calculations. The magnetron sputteringplasma is focused by the magnetic field along the magnetic force linesof the magnetic beam which contributes to the increase of the ionizationefficiency of the RAAMS process. Referring to FIG. 27B it isdemonstrating the increase of concentrations of excited argon atoms andconcentration of atomic nitrogen in RAAMS plasma in argon-nitrogengaseous mixture with increase of the remote arc current. This can bealso attributed to a substantial increase of electron density andtemperature in RAAMS plasma when the remote arc current increases.

FIG. 28A is a schematic illustration of the metal vapor ionizationsensor used for the measurement of the chrome ionization rate in RAAMSdischarge which is presented in FIG. 28B. A gridded quartz crystalmicrobalance (GQCM) sensor 830 with an INFICON Front Load Dual Sensorcoupled with a quartz crystal microbalance is used for directmeasurement of the metal ionization rate. The output of the QCM goesinto a transducer 840 and computer 842. The wiring diagram 832 shows thegrounded grid 834 the first grid 836 and the second grid 838. The firstgrid 836 has a potential of 12 v with respect to ground potential andthe second grid 838 has a variable potential from −12 v to 88 v. Themeasurement of the ionization rate in metal sputtering flow can bedefined as following:

${\gamma_{i} = \frac{{\overset{.}{m}}_{i}}{\overset{.}{m} + {\overset{.}{m}}_{i}}},$where m′ and m′₁ are mass flows of neutral vapor and metal ionsrespectively. For measurement of the ionization rate γ_(i) both sensorshave identical gridded energy analyzer (GEA) head, but GEA will beactivated only in one of these sensors, while GEA of the second sensorwill remain passive. The sensor #1 with active GEA is measuring theneutral metal vapor flux g₁=m′ by repelling the ionized vapor component,while sensor #2 with passive GEA is measuring the total metal vapor fluxg₂=m′+m′_(i). In this case the influence of the GEA on deposition rateat the sensor crystal surface is being same for both sensor #1 andsensor #2. The ionization rate is then defined by the ratio of thesensor #1 reading g₁ to the sensor #2 reading g₂:γ_(i)=(g ₂ −g ₁)/g ₂

FIG. 28B shows the ionization rate of chrome sputtering atoms measuredby GQCM probe in the RAAMS discharge with and without opposite magnets,which mimics the configuration shown in FIGS. 22B and 22C withoutcurrent in the coils. It can be seen that onization of chrome sputteringatoms increases with the increase of the remote anode current. Increaseof the magnetic confinement field due to the opposite magnets results insubstantial increase of the chrome ionization in RAAMS discharge inagreement with the results obtained by OES.

The chrome ionization levels of the sputtering flux shown in FIGS. 27Aand 28B are the average amount of chrome ionization in the sputteringflow in a diameter from about 20 mm to 50 mm. The GQCM sensors as wellas OES plasma monitor are measuring the ionization values of the metalsputtering flow with a relatively high integration time, on the order ofone measurement per second. The instantaneous ionization degree in thearea where the arc jet crosses the magnetron racetrack is up to 100%.

In another embodiment, a coated article formed by the methods andsystems set forth above is provided. With reference to FIG. 29A, coatedarticle 926 comprises substrate 928 having surface 930 and coating 932disposed over surface 930. In a refinement, the coating is a protectivecoating. Typically, the coating has a dense microstructure and acharacteristic color. In a refinement, the coating includes a refractorymetal reacted with nitrogen, oxygen and/or carbon to form a refractorymetal nitride, oxide, or carbide. Examples of suitable refractory metalsinclude, but are not limited to, chromium, hafnium, tantalum, zirconium,titanium and zirconium-titanium alloy. Chromium nitride is an example ofa particularly useful coating made by the methods set forth above. In arefinement, the coating has a thickness from about 1 to about 6 microns.With reference to FIG. 29B, a variation of a chromium nitride coating,which is a multilayer structure formed by the methods set forth above,is provided. Coated article 934 includes thin layer 936 of an unreactedchromium layer disposed over substrate 928 and a thick stoichiometricchromium nitride layer 938 disposed over unreacted chromium layer 936.In a further refinement, the multilayer structure further includes layer940 of intermediate sub-stoichiometric chromium nitride layer disposedover the stoichiometric chromium nitride layer 938. Intermediatestoichiometric chromium nitride 940 has a stoichiometry given byCrN_((1-x)) where x is a number between 0.3 and 1.0. In a refinement,the thickness of the unreacted chromium layer 936 is between 0.05 and0.5 microns, the thickness of the thick chromium nitride layer 938 isfrom 1 to 3 microns, and the intermediate stoichiometric chromiumnitride 940 is from 0.5 to 1 micron.

While embodiments of the invention have been illustrated and described,it is not intended that these embodiments illustrate and describe allpossible forms of the invention. Rather, the words used in thespecification are words of description rather than limitation, and it isunderstood that various changes may be made without departing from thespirit and scope of the invention.

What is claimed is:
 1. A vacuum coating and plasma treatment systemcomprising: a first plasma assembly facing a substrate, the first plasmaassembly including: a magnetron cathode including a magnetron targetwith a long edge and a short edge; a remote anode electrically connectedto the magnetron cathode; a remote arc discharge generated separate fromthe magnetron cathode and adjacent to the magnetron target; a remote arcdischarge cathode hood extending over the remote arc discharge andacross the short edge of the magnetron cathode; and a primary cathodepositioned in the remote arc discharge cathode hood; a remote arcdischarge anode hood, the remote arc discharge anode hood and the remotearc discharge cathode hood being positioned on opposing sides of themagnetron cathode wherein the remote anode is positioned in the remotearc discharge anode hood; a magnetic system creating magnetic fieldlines which extends into and confines a plasma in front of the firstplasma assembly and a substrate, the magnetic system including magnetsthat form a magnetic barrier and a sputtering racetrack such that theremote arc discharge is confined by the magnetic barrier and extendsalong a direction parallel to the long edge of the magnetron target, theremote arc discharge extending from the remote arc discharge cathodehood to the remote arc discharge anode hood; a magnetron cathode powersupply connected to the magnetron cathode and to the remote anode; and aremote arc discharge power supply connected between the remote anode andthe primary cathode.
 2. The system of claim 1 wherein the magnetroncathode is powered by a DC power supply having an output voltage rangingfrom 100V to 2000V.
 3. The system of claim 1 wherein the magnetroncathode is powered by a RF power supply.
 4. The system of claim 1wherein the magnetron cathode is powered by a DC pulse power supply. 5.The system of claim 4 wherein the DC pulse power supply has an outputvoltage ranging from 300V to 10 kV.
 6. The system of claim 4 wherein apower density to the magnetron target ranges from 50 W/cm² to 50 kW/cm².7. The system of claim 1 wherein there are two remote arc dischargeshaving a voltage differential of 50V to 3000V.
 8. The system of claim 1,wherein the magnetron target moves into and out of the plasma.
 9. Thesystem of claim 1 wherein the magnets include an electromagnet locatedbehind the magnetron target to generate a magnetic field in front of themagnetron target.
 10. The system of claim 1 wherein the magnets includea permanent magnet located behind the magnetron target to generate amagnetic field in front of the magnetron target.
 11. The system of claim1 wherein the remote arc discharge has a current density from 1 to 300amps/cm².
 12. The system of claim 1 further comprising a wire electrodeshaped in a convex direction with an apex toward the substrate.
 13. Thesystem of claim 1 further comprising more than one vacuum coating andplasma treatment system attached adjacent each other where the magneticsystem has field lines from magnetic coils that are alternating.
 14. Thesystem of claim 1 further comprising a second plasma assembly withmagnetic coils, the second plasma assembly facing the first plasmaassembly where a first side of a substrate holder faces the first plasmaassembly and a second side of the substrate holder faces the secondplasma assembly.
 15. The system of claim 1 wherein the remote arcdischarge enters the plasma from a side of the remote arc dischargecathode hood.
 16. The system of claim 1 wherein the remote arc dischargeis generated by a thrust from an arc jet.
 17. The system of claim 1wherein the remote arc discharge has a DC power supply.
 18. The systemof claim 1 wherein the remote arc discharge has a pulsed DC powersupply.
 19. The system of claim 18 has a pulsed current from 10 A to 100kA.
 20. The system of claim 1 wherein the remote arc discharge has a RFpower supply.
 21. The system of claim 1 wherein the remote arc dischargeis generated by opposing rod electrodes with a rod axis extending fromone rod electrode to an opposing rod electrode and one rod electrode hasa central gas inlet.
 22. The system of claim 21 wherein a distancebetween the rod axis and a magnetron target is from 5 to 40 mm.
 23. Thesystem of claim 21 wherein a distance between the rod axis and amagnetron target is from 10 to 25 mm.
 24. The system of claim 21 whereina distance between the opposing rod electrodes is 2 and 30 mm.
 25. Thesystem of claim 21 wherein a diameter of the rod electrodes is from 5 to30 mm.
 26. A vacuum coating and plasma treatment system comprising: aplasma assembly facing a substrate, the plasma assembly including: amagnetron cathode including a magnetron target with a long edge and ashort edge; a remote anode electrically connected to the magnetroncathode; a remote arc discharge generated separate from the magnetroncathode and adjacent to the magnetron target; a remote arc dischargecathode hood extending over the remote arc discharge and across theshort edge of the magnetron cathode; and a primary cathode positioned inthe remote arc discharge cathode hood; a remote arc discharge anodehood, the remote arc discharge anode hood and the remote arc dischargecathode hood being positioned on opposing sides of the magnetron cathodewherein the remote anode is positioned in the remote arc discharge anodehood; a magnetic system creating magnetic field lines which extends intoand confines a plasma in front of the plasma assembly and a substrate,the magnetic system including magnets that form a magnetic barrier and asputtering racetrack such that the remote arc discharge is confined bythe magnetic barrier and extends along a direction parallel to the longedge of the magnetron target, the remote arc discharge extending fromthe remote arc discharge cathode hood to the remote arc discharge anodehood; a magnetron cathode power supply connected to the magnetroncathode and to the remote anode; a remote arc discharge power supplyconnected between the primary cathode and the remote anode; and a wireelectrode shaped in a convex direction toward the substrate.
 27. Thesystem of claim 26 further comprising more than one vacuum coating andplasma treatment system attached adjacent each other where the magneticsystem has field lines from magnetic coils that are alternating.
 28. Thesystem of claim 26 further comprising a second coating assembly withmagnetic coils facing a first coating assembly where two sides of asubstrate holder each face a coating assembly.
 29. The system of claim26 wherein the remote arc discharge is generated by opposing rodelectrodes with a rod axis extending from one rod electrode to anopposing rod electrode.